A two-dimensional, axisymmetric model of a magnetized glow discharge plasma

Plasma Sources Science and Technology

Volumn 3, Issue 1, 1994, Pages 25-39

  Porteous, R K ^a   Wu, H M ^a   Graves, D B ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36149036895     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/3/1/004     Document Type: Article

References (40)

1. Electron cyclotron resonance microwave discharges for etching and thin-film deposition
2. Etching results and comparison of low pressure electron cyclotron resonance and radio frequency discharge sources
3. Plasma characterization for a divergent field electron cyclotron resonance source
4. Plasma characterization of an electron cyclotron resonance–radio-frequency hybrid plasma reactor
5. Electrical and optical measurements of electron cyclotron resonance discharges in Cl2 and Ar
6. The effects of substrate potentials on electron cyclotron resonance plasmas
7. Ion energetics in electron cyclotron resonance discharges
8. Modeling of plasma flow downstream of an electron cyclotron resonance plasma source
9. Charge Exchange between Gaseous Ions and Atoms
10. Plasma uniformity and power deposition in electron cyclotron resonance etch tools