Silicon oxide particle formation in RF plasmas investigated by infrared absorption spectroscopy and mass spectrometry

Journal of Physics D: Applied Physics

Volumn 31, Issue 1, 1998, Pages 74-84

  Hollenstein, Ch ^a   Howling, A A ^a   Courteille, C ^a   Magni, D ^a   Scholz, S M ^a   Kroesen, G M W ^b   Simons, N ^b   De Zeeuw, W ^b   Schwarzenbach, W ^c  

^a EPFL   (Switzerland)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c UNIV GRENOBLE ALPES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; COMPOSITION EFFECTS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IONS; MASS SPECTROMETRY; MATHEMATICAL MODELS; PARTICLES (PARTICULATE MATTER); PLASMAS; SILANES; STOICHIOMETRY;

IONIC CLUSTERS; SILICON OXIDES;

SILICA;

EID: 0032491759     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/31/1/011     Document Type: Article

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