Langmuir probe measurements in an expanding magnetized plasma

Physical Review E - Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics

Volumn 54, Issue 2, 1996, Pages 1906-1911

  Brussaard, G J H ^a,b   van der Steen, M ^a,b   Carrere M ^a,b   van de Sanden, M C M ^a,b   Schram, D C ^a,b  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b Univ of Saint Jérôme   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003834831     PISSN: 1063651X     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevE.54.1906     Document Type: Article

References (17)

1. M. J. de Graaf, R J. Severens, L. J. van IJzendoorn, F. Munnik, H. J. M. Meijers, H. Kars, M. C. M. van de Sanden and D C. Schram, Surf. Coat. Technol.74, 351 (1995).
2. R J. Severens, G. J. H. Brussaard, M. C. M. van de Sanden and D C. Schram, Appl. Phys. Lett.67, 491 (1995).
3. A. J. M. Buuron, M. C. M. van de Sanden, W. J. van Ooij, R. M. A. Driessens and D C. Schram, J. Appl. Phys.78, 528 (1995).
4. A. J. M. Buuron, J J. Beulens, P. Groot, J. Bakker and D C. Schram, Thin Solid Films212, 282 (1992).
5. R. F. G. Meulenbroeks, R. A. H. Engeln, M. N. A. Beurskens, R. M. J. Paffen, M. C. M. van de Sanden, J. A. M. van der Mullen and D C. Schram, Plasma Sources Sci. Technol.4, 74 (1995).
6. L. Schott, in Plasma Diagnostics, edited by W. Lochte-Holtgraven (North-Holland, Amsterdam 1968), Chap. 11.
7. M. Bacal, G W. Hamilton, A M. Bruneteau and H J. Doucet, Rev. Sci. Instrum.50, 719 (1979).
8. H. Mott-Smith and I. Langmuir, Phys. Rev.28, 727 (1926).
9. J G. Laframboise, University of Toronto, Institute for Aerospace Studies Report No. 100, 1966 (unpublished).
10. D. Bohm, E. H. S. Burhop, and H. S. W. Massey: The Characteristics of Electrical Discharges in Magnetic Fields, edited by A. Guthrie and R. K. Wakering (McGraw-Hill, New York, 1949).
11. R J. Bickerton and A. von Engel, Proc. Phys. Soc. London Sect. B69, 468 (1956).
12. J R. Sanmartin, Phys. Fluids13, 103 (1970).
13. T. Dote, H. Amemiya and T. Ichimiya, Jpn. J. Appl. Phys.3, 789 (1964).
14. E O. Johnson and L. Malter, Phys. Rev.80, 58 (1950).
15. R P. Dahiya, M. J. de Graaf, R J. Severens, H. Swelsen, M. C. M. van de Sanden and D C. Schram, Phys. Plasmas1, 2086 (1994).
16. E. Graham, D R. James, W C. Keever, I R. Gatland, D L. Albritton and E W. McDaniel, J. Chem. Phys.59, 4648 (1973).
17. H. Amemiya, J. Phys. D23, 999 (1990).