Ternary phase analysis of interfacial silicates grown in HfO x/Si and Hf/SiO 2/Si systems

Thin Solid Films

Volumn 472, Issue 1-2, 2005, Pages 317-322

  Lee, Jung Ho ^a,b  

^a Hanyang University   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

Hafnium; Interfaces; Scanning tunneling microscopy; X ray photoelectron spectroscopy

Indexed keywords

FILM STACKS; INTERFACES; SCANNING TUNNELING MICROSCOPY (STM); SEMICONDUCTOR DEVICE FABRICATION;

ANNEALING; DIELECTRIC MATERIALS; HAFNIUM COMPOUNDS; OXIDES; SILICATES; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

PHASE MEASUREMENT;

EID: 9944257507     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.07.060     Document Type: Article

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