Experimental measurement of the electron energy distribution function in the radio frequency electron cyclotron resonance inductive discharge

Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 69, Issue 1 2, 2004, Pages 164061-164066

  Chung, ChinWook ^a   Kim, S S ^b   Chang, H Y ^c  

^a Hanyang University   (South Korea)

^b Korea Basic Science Institute (KBSI)   (South Korea)

^c Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; CARRIER CONCENTRATION; DIFFUSION; ELECTRON CYCLOTRON RESONANCE; ELECTRON ENERGY LEVELS; FREQUENCIES; FUNCTIONS; HEATING; MAGNETIC FIELD EFFECTS; MAGNETIZATION; PLASMA SOURCES; PROBABILITY; TUNGSTEN;

ELECTRON ENERGY DISTRIBUTION FUNCTIONS (EEDF); MAGNETIZED INDUCTIVELY COUPLED PLASMAS (MICP);

INDUCTIVELY COUPLED PLASMA;

EID: 8644257916     PISSN: 1063651X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (33)

1. M.A. Lieberman and V.A. Godyak, IEEE Trans. Plasma Sci. 26, 955 (1998).
2. V.A. Godyak and V.I. Kolobov, Phys. Rev. Lett. 79, 4589 (1997).
3. M.M. Turner, Phys. Rev. Lett. 71, 1844 (1993).
4. ChinWook Chung, S.S. Kim, S.H. Seo, H.Y. Chang, and N.S. Yoon, J. Appl. Phys. 88, 1181 (2000).
5. ChinWook Chung, K.I. You, and H.Y. Chang, Phys. Plasmas 8, 2992 (2001).
6. ChinWook Chung, S.H. Seo, and H.Y. Chang, Phys. Plasmas 7, 3584 (2000).
7. H.J. Lee, I.D. Yang, and K.W. Whang, Plasma Sources Sci. Technol. 5, 383 (1996).
8. H.J. Lee, J.H. Kim, K.W. Whang, and J.H. Joo, J. Vac. Sci. Technol. A 14, 1007 (1996).
9. S.S. Kim, C.S. Chang, N.S. Yoon, and K.W. Whang, Phys. Plasmas 6, 2926 (1999).
10. F.F. Chen, J. Vac. Sci. Technol. A 10, 1389 (1992).
11. T. Lho, N. Hershkowitz, J. Miller, W. Steer, and G.H. Kim, Phys. Plasmas 5, 3135 (1998).
12. J.E. Stevens, M.J. Sowa, and J.L. Cecchi, J. Vac. Sci. Technol. A 13, 2476 (1995).
13. ChinWook Chung, S.S. Kim, and H.Y. Chang, Phys. Rev. Lett. 88, 095002 (2002).
14. J. Asmussen, T.A. Grotjohn, P. Mak, and M.A. Perrin, IEEE Trans. Plasma Sci. 25, 1196 (1997).
15. S. Matsuv and T. Adachi, Jpn. J. Appl. Phys., Part 1 21, 14 (1982).
16. Y. Weng and M.J. Kushner, J. Appl. Phys. 72, 33 (1992).
17. B.-W. Koo, Noah Hershikowitz, and M. Sarfaty, J. Appl. Phys. 86, 1213 (1999).
18. V.I. Demidov, S.V. Ratynskaia, R.J. Armstrong, and K. Rypadal, Phys. Plasmas 6, 350 (1999).
19. S.H. Seo, C.W. Chung, J.I. Hong, and H.Y. Chang, Phys. Rev. E 62, 7155 (2000).
20. V.A. Godyak, R.B. Piejak, and B.M. Alexandrovich, Plasma Sources Sci. Technol. 1, 36 (1992).
21. R.R. Arslanbekov, N.A. Khromov, and A.A. Kudryavtsev, Plasma Sources Sci. Technol. 3, 528 (1994).
22. V.A. Godyak and R.B. Piejak, Phys. Rev. Lett. 65, 996 (1990).
23. S.H. Seo, J.I. Hong, and H.Y. Chang, Appl. Phys. Lett. 74, 2776 (1999).
24. M.A. Liberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processings (Wiley, New York, 1994).
25. S.H. Seo, ChinWook Chung, and H.Y. Chang, Surf. Coat. Technol. 131, 1 (2000).
26. V.A. Godyak, in of Plasma-Surface Interactions and Processing Materials, edited by O. Auciello et al. (Kluwer, Dordrecht, The Netherlands, 1990), pp. 95-134.
27. C.G. Goedde, A.J. Lichtenberg, and M.A. Lieberman, J. Appl. Phys. 64, 4375 (1989).
28. V.I. Kolobov, D.P. Lymberopoulos, and D.J. Economou, Phys. Rev. E 55, 3408 (1997).
29. U. Kortshagen, C. Busch, and L.D. Tsendin, Plasma Sources Sci. Technol. 5, 1 (1996).
30. S.S. Kim, C.W. Chung, and H.Y. Chang, Thin Solid Films 435, 72 (2003).
31. V.A. Godyak, R.B. Piejak, and B.M. Alexandrovich, Plasma Sources Sci. Technol. 11, 525 (2002).
32. C.W. Chung, and H.Y. Chang, Appl. Phys. Lett. 80, 1725 (2002).
33. T. Lho, N. Hershkowitz, J. Miller, W. Steer, and G.H. Kim, Phys. Plasmas 5, 3135 (1998).