Effects of magnetic field on oxide etching characteristics in planar type radio frequency inductively coupled plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 1007-1010

  Lee, Ho Jun ^a   Kim, Jung Hun ^a   Whang, Ki Woong ^a   Joo, Jung Hoon ^b  

^a Seoul National University   (South Korea)

^b Kunsan National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000714239     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580122     Document Type: Article

References (21)

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