Nanoscale magnification and shape control system for precision overlay in jet and flash imprint lithography

IEEE/ASME Transactions on Mechatronics

Volumn 20, Issue 1, 2015, Pages 122-131

  Cherala, Anshuman ^a   Schumaker, Philip ^a   Mokaberi, Babak ^a,b   Selinidis, Kosta ^a   Choi, Byung Jin ^a   Meissl, Mario J ^a   Khusnatdinov, Niyaz N ^a   LaBrake, Dwayne ^a   Sreenivasan, S V ^a,c  

^a MOLECULAR IMPRINTS INC   (United States)

^b Samsung Austin Semiconductor   (United States)

^c The University of Texas at Austin   (United States)

Author keywords

In liquid alignment and overlay systems; jet and flash imprint lithography (J FIL); precision magnification and shape control systems

Indexed keywords

CONTROL SYSTEMS; FLOWCHARTING; LIQUIDS; LITHOGRAPHY; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

DESIGN AND DEVELOPMENT; FLASH IMPRINT LITHOGRAPHY; MIX AND MATCH; NANOPRECISION; OVERLAY METROLOGY; OVERLAY SYSTEMS; SEMICONDUCTOR MANUFACTURING; STATE OF THE ART;

NANOIMPRINT LITHOGRAPHY;

EID: 85027946642     PISSN: 10834435     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMECH.2013.2297679     Document Type: Article

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