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Volumn 2003-September, Issue , 2003, Pages 425-432

Radiation-induced back channel leakage in 60 MeV-proton-irradiated 0.10 μm-CMOS Partially Depleted SOI MOSFETs

Author keywords

Buried oxide; Floating body effects; Proton irradiation; Radiation effects; Silicon on insulator (SOI); Switch off transient; Total dose effects; Transconductance peak

Indexed keywords

CMOS INTEGRATED CIRCUITS; GATE DIELECTRICS; IRRADIATION; MOS DEVICES; PROTON IRRADIATION; RADIATION; RADIATION EFFECTS; RECONFIGURABLE HARDWARE; SILICON ON INSULATOR TECHNOLOGY; SPACE APPLICATIONS; TRANSCONDUCTANCE;

EID: 84995663205     PISSN: 03796566     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (4)

References (27)
  • 3
    • 0031150274 scopus 로고    scopus 로고
    • Advantages and limitations of Silicon-on-Insulator technology in radiation environments
    • J. R. Schwank, "Advantages and limitations of Silicon-on-Insulator technology in radiation environments", Microelectronic Engineering, vol. 36, pp. 335-342, 1997.
    • (1997) Microelectronic Engineering , vol.36 , pp. 335-342
    • Schwank, J.R.1
  • 6
    • 0041441251 scopus 로고    scopus 로고
    • "Linear kink effect" induced by electron valence band tunneling in ultrathin gate oxide bulk and SOI MOSFETs
    • July
    • A. Mercha, J. M. Raff, E. Simoen, A. Augeadre, and C. Claeys, ""Linear kink effect" induced by electron valence band tunneling in ultrathin gate oxide bulk and SOI MOSFETs", IEEE Trans. Electron Dev., vol. 50, no. 7, pp. 1675-2682, July 2003.
    • (2003) IEEE Trans. Electron Dev. , vol.50 , Issue.7 , pp. 1675-2682
    • Mercha, A.1    Raff, J.M.2    Simoen, E.3    Augeadre, A.4    Claeys, C.5
  • 7
    • 0032317363 scopus 로고    scopus 로고
    • Total dose radiation hard 0.35 nm SOI CMOS technology
    • Dec.
    • S. T. Liu, W. C. Jenkins, and H. L. Hughes, "Total dose radiation hard 0.35 nm SOI CMOS technology", IEEE Trans. Nucl. Sci., vol. 45, no. 6, pp. 2442-2449, Dec. 1998.
    • (1998) IEEE Trans. Nucl. Sci. , vol.45 , Issue.6 , pp. 2442-2449
    • Liu, S.T.1    Jenkins, W.C.2    Hughes, H.L.3
  • 13
    • 0031166726 scopus 로고    scopus 로고
    • Total dose effects on a fully-depleted SOI NMOSFET and its lateral parasitic transistor
    • June
    • V. Ferlet-Cavrois, O. Musseau, J.-L. Leray, J.-L. Pelloie, and C. Raynaud, "Total dose effects on a fully-depleted SOI NMOSFET and its lateral parasitic transistor", IEEE Trans. Electron Dev., vol. 44, no. 6, pp. 965-971, June 1997.
    • (1997) IEEE Trans. Electron Dev. , vol.44 , Issue.6 , pp. 965-971
    • Ferlet-Cavrois, V.1    Musseau, O.2    Leray, J.-L.3    Pelloie, J.-L.4    Raynaud, C.5
  • 14
    • 0025430219 scopus 로고
    • Modes of operation and radiation sensitivity of ultrathin SOI transistors
    • May
    • D C. Mayer, "Modes of operation and radiation sensitivity of ultrathin SOI transistors", IEEE Trans. Electron Dev., vol. 37, no. 5, pp. 12801288, May 1990.
    • (1990) IEEE Trans. Electron Dev. , vol.37 , Issue.5 , pp. 12801288
    • Mayer, D.C.1
  • 18
    • 33645256083 scopus 로고    scopus 로고
    • Impact of technology scaling in SOI back-channel total dose tolerance. A 2-D numerical study using self-consistent oxide code
    • J.-L. Leray, P. Paillet, V. Ferlet-Cavrois, C. Tavemier, K. Belhaddad, and O. Penzin, "Impact of technology scaling in SOI back-channel total dose tolerance. A 2-D numerical study using self-consistent oxide code", Proc. of RADECS, pp. 321-327, 1999.
    • (1999) Proc. of RADECS , pp. 321-327
    • Leray, J.-L.1    Paillet, P.2    Ferlet-Cavrois, V.3    Tavemier, C.4    Belhaddad, K.5    Penzin, O.6
  • 20
    • 0026188701 scopus 로고
    • Lateral isolation in SOI CMOS technology
    • July
    • M. Haond, and O. Le Neel, "Lateral isolation in SOI CMOS technology", Solid-St. Technology, vol. 34, no. 7, pp. 47-52, July 1991.
    • (1991) Solid-St. Technology , vol.34 , Issue.7 , pp. 47-52
    • Haond, M.1    Le Neel, O.2
  • 22
    • 0032139808 scopus 로고    scopus 로고
    • Geueration-recombination transient effects in partially depleted SOI transistors: Systematic experiments and simulations
    • Aug.
    • D. Munteanu, D. A. Weiser, S. Cristoloveanu, O. Faynot, J. L. Pelloie, and J. G. Fossum, "Geueration-recombination transient effects in partially depleted SOI transistors: systematic experiments and simulations", IEEE Trans. Electron Dev., vol. 45, no. 8, pp. 16781683, Aug. 1998.
    • (1998) IEEE Trans. Electron Dev. , vol.45 , Issue.8 , pp. 16781683
    • Munteanu, D.1    Weiser, D.A.2    Cristoloveanu, S.3    Faynot, O.4    Pelloie, J.L.5    Fossum, J.G.6
  • 25
    • 1442282076 scopus 로고
    • Generation lifetime, interface state density, active defect density aad oxide resistivity measurements for SOI-MOSFETs and their radiation dependence
    • Dec.
    • D. Kifflpton, and J. Kerr, "Generation lifetime, interface state density, active defect density aad oxide resistivity measurements for SOI-MOSFETs and their radiation dependence", IEEE Trans. Nucl. Sci., vol. 39, no. 6, pp. 2126-2131, Dec. 1992.
    • (1992) IEEE Trans. Nucl. Sci. , vol.39 , Issue.6 , pp. 2126-2131
    • Kifflpton, D.1    Kerr, J.2
  • 27
    • 84995601397 scopus 로고    scopus 로고
    • Impact of gate tunneling floating body charging on drain current transients of 0.10 Hm-CMOS partially depleted SOI MOSFETs
    • J. M. Raff, A. Mercha, E. Simoen, and C. Claeys, "Impact of gate tunneling floating body charging on drain current transients of 0.10 Hm-CMOS partially depleted SOI MOSFETs", Manuscript to be subnutted for publication.
    • Manuscript to Be Subnutted for Publication
    • Raff, J.M.1    Mercha, A.2    Simoen, E.3    Claeys, C.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.