Vacuum ultraviolet photochemical selective area atomic layer deposition of Al2O3 dielectrics

AIP Advances

Volumn 5, Issue 1, 2015, Pages

  Chalker, P R ^a   Marshall, P A ^a   Dawson, K ^a   Brunell, I F ^a   Sutcliffe, C J ^a   Potter, R J ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; DEPOSITION RATES; DIELECTRIC MATERIALS; FLUORINE COMPOUNDS; LIGHT SOURCES; MAGNESIUM COMPOUNDS; MOLECULAR OXYGEN; THIN FILMS;

ELLIPSOMETRIC MEASUREMENTS; FORMING GAS ANNEALING; LOGARITHMIC FUNCTIONS; PHOTOLITHOGRAPHIC MASKS; SELECTIVE-AREA ATOMIC LAYER DEPOSITION; TRIMETHYL ALUMINUMS; VACUUM ULTRAVIOLET LIGHT; VACUUM ULTRAVIOLETS;

ATOMIC LAYER DEPOSITION;

EID: 84923768038     PISSN: None     EISSN: 21583226     Source Type: Journal    
DOI: 10.1063/1.4905887     Document Type: Article

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