Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure

Surface and Coatings Technology

Volumn 295, Issue , 2016, Pages 112-118

  Schafer J ^a   Hnilica, J ^b   Sperka J ^b   Quade, A ^a   Kudrle, V ^b   Foest, R ^a   Vodak J ^c   Zajίckova L ^b  

^a LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

^b MASARYK UNIVERSITY   (Czech Republic)

^c BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

Author keywords

Plasma jet; Silicon dioxide; Tetrakis(trimethylsiloxy)silane; Tetrakis(trimethylsilyloxy)silane

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CARBON FILMS; PLASMA CVD; PLASMA JETS; SILICA; SILICON OXIDES;

EXCITATION FREQUENCY; MICROWAVE PLASMA JET; ORGANIC MOLECULES; ORGANOSILICON POLYMERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS (PE CVD); POWER DENSITIES; RADIO FREQUENCY PLASMA; TETRAKIS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 84951193869     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2015.09.047     Document Type: Article

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