PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure

Journal of Physics D: Applied Physics

Volumn 46, Issue 33, 2013, Pages

  Hnilica, J ^a   Schafer J ^b   Foest, R ^b   Zajickova L ^a   Kudrle, V ^a  

^a MASARYK UNIVERSITY   (Czech Republic)

^b LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE PLASMAS; DEPOSITION CONDITIONS; DISPERSIVE COMPONENTS; ELECTRON MICROSCOPY (SEM); MICROWAVE PLASMA JET; ROTATIONAL TEMPERATURE; SUPERHYDROPHOBICITY; TIME RESOLVED OPTICAL EMISSION SPECTROSCOPY;

ATMOSPHERIC PRESSURE; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROWAVES; MODULATION; PLASMA DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA JETS; X RAY SPECTROSCOPY;

SILICON OXIDES;

EID: 84881300890     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/46/33/335202     Document Type: Article

References (28)

1. Belmonte T, Henrion G and Gries T 2011 J. Therm. Spray Technol. 20 744-59
2. Tendero C, Tixier C, Tristant P, Desmaison J and Leprince P 2006 Spectrochim. Acta B 61 2-30 (Pubitemid 43224135)
3. Hopfe V and Sheel D W 2007 Plasma Process. Polym. 4 253-65 (Pubitemid 46736288)
4. Kanazawa S, Kogoma M, Moriwaki T and Okazaki S 1988 J. Phys. D: Appl. Phys. 21 838-40
5. Lee D and Yang S 2012 Sensors Actuators B 162 425-34
6. Premkumar P A, Starostin S A, Creatore M, de Vries H, Paffen R M J, Koenraad P M and van de Sanden M C M 2010 Plasma Process. Polym. 7 635-9
7. Schütze A, Jeong J Y, Babayan S E, Park J, Selwyn G S and Hicks R F 1998 IEEE Trans. Plasma Sci. 26 1685-94
8. Laroussi M and Akan T 2007 Plasma Process. Polym. 4 777 (Pubitemid 350143157)
9. Bardos L and Barankova H 2010 Thin Solid Films 518 6705-13
10. Babayan S E, Jeong J Y, Tu V J, Park J, Selwyn G S and Hicks R F 1998 Plasma Sources Sci. Technol. 7 286-8
11. Janča J, Klíma M, Slavíček P and Zajíčková L 1999 Surf. Coat. Technol. 116-119 547-51 (Pubitemid 30513681)
12. Schäfer J, Foest R, Quade A, Ohl A and Weltmann K-D 2008 J. Phys. D: Appl. Phys. 41 194010
13. Hnilica J, Kudrle V and Potočňáková L 2012 IEEE Trans. Plasma Sci. 40 2925
14. Schäfer J, Sigeneger F, Foest R, Loffhagen D and Weltmann K-D 2010 Eur. Phys. J. D 60 531-8
15. Schäfer J, Foest R, Ohl A and Weltmann K-D 2009 Plasma Phys. Control. Fusion 51 124045
16. Hnilica J, Kudrle V, Vašina P, Schäfer J and Aubrecht V 2012 J. Phys. D: Appl. Phys. 45 055201
17. Schäfer J, Foest R, Quade A, Ohl A, Meichsner J and Weltmann K-D 2009 Eur. Phys. J. D 54 211-7
18. Moisan M, Beaudry C and Leprince P 1974 Phys. Lett. 50 125
19. Griem H R 1964 Plasma Spectroscopy (New York: McGraw-Hill)
20. Calzada M D, Moisan M, Gamero A and Sola A 1996 J. Appl. Phys. 80 46
21. Sainz A, Margot J, Garcia M C and Calzada M D 2005 J. Appl. Phys. 97 113305 (Pubitemid 40844729)
22. Van der Mullen J A M 1990 Phys. Rep. 191 109
23. Meinel H and Krauss L 1969 J. Quant. Spectrosc. Radiat. Transfer 9 443
24. Calzada M D, Garcia M, Luque J M and Santiago I 2002 J. Appl. Phys. 92 2269-75 (Pubitemid 35037813)
25. Kanaya K and Okayama S 1972 J. Phys. D: Appl. Phys. 5 43-58
26. Lee Smith A 1960 Spectrochim. Acta 16 87
27. Pai P G, Chao S S, Takagi Y and Lucovsky G 1986 J. Vac. Sci. Technol. A 4 689-94
28. Good R J 1992 J. Adhes. Sci. Technol. 6 1269-302