Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Schäfer, Jan ^a   Horn, Stefan ^a   Foest, Rüdiger ^a   Brandenburg, Ronny ^a   Vašina, Petr ^b   Weltmann, Klaus Dieter ^a  

^a LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

^b MASARYK UNIVERSITY   (Czech Republic)

Author keywords

Ag release film; Antimicrobial coating; Atmospheric pressure DBD; ATR FTIR; Implants; PECVD

Indexed keywords

ANTIMICROBIAL COATINGS; ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGES; ATR FTIR; BARRIER PROPERTIES; CHEMICAL COMPOSITIONS; COMPLEX ANALYSIS; DEPOSITED FILMS; DEPOSITION CONDITIONS; DIFFERENT PRECURSORS; EXPERIMENTAL STUDIES; HYDROXYL GROUPS; IR ABSORPTION; OPERATION PARAMETERS; ORGANOSILICON FILMS; RELEASE FILM; SILVER IONS; VERTICAL STRUCTURES; WET CONDITIONS;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC MOVEMENTS; ATMOSPHERIC PRESSURE; ATMOSPHERICS; COATINGS; FLOW CONTROL; GAS FUEL ANALYSIS; METAL IONS; MICROORGANISMS; SILANES; SILICON COMPOUNDS;

DIELECTRIC DEVICES;

EID: 79959774061     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.03.124     Document Type: Article

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