Mapping of properties of thin plasma jet films using imaging spectroscopic reflectometry

Measurement Science and Technology

Volumn 25, Issue 11, 2014, Pages

  Necas D ^a   Cudek V ^a   Vodak J ^b   Ohlidal M ^b   Klapetek, P ^c   Benedikt, J ^d   Rugner K ^d   Zajickova L ^a  

^a MASARYK UNIVERSITY   (Czech Republic)

^b BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

^c CZECH METROLOGY INSTITUTE   (Czech Republic)

^d RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

imaging spectrophotometry; micro plasma jet; non uniform thin films; optical properties; thickness mapping

Indexed keywords

ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; CCD CAMERAS; CHARGE COUPLED DEVICES; FIGHTER AIRCRAFT; MAPPING; OPTICAL PROPERTIES; PLASMA JETS; SPECTROPHOTOMETRY; THIN FILMS;

HEXAMETHYL DISILOXANE; MICRO-PLASMA JET; NON-UNIFORM; OPTICAL CHARACTERISATION; SILICON SUBSTRATES; SPECTROSCOPIC REFLECTOMETRY; THICKNESS PROFILES; THIN-FILM PROPERTIES;

OPTICAL FILMS;

EID: 84907884444     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/25/11/115201     Document Type: Article

References (33)

1. Tompkins H G and McGahan W A 1999 Spectroscopic Ellipsometry and Reflectometry: a User's Guide (New York: Wiley-Interscience)
2. Tompkins H and Haber E A 2005 Handbook of Ellipsometry (New York: William Andrew)
3. Quinten M 2012 A Practical Guide to Optical Metrology for Thin Films (Berlin: Wiley-VCH)
4. Stiblert L and Sandström T 1983 Geometrical resolution in the comparison ellipsometer J. Phys. Paris 44 C10
5. Beaglehole D 1988 Performance of a microscopic imaging ellipsometer Rev. Sci. Instrum. 59 2557-9
6. Wurstbauer U, Roeling C, Wurstbauer U, Wegscheider W, Vaupel M, Thiesen P H and Weiss D 2010 Imaging ellipsometry of graphene Appl. Phys. Lett. 97 231901
7. Asinovski L, Beaglehole D and Clarkson M T 2008 Imaging ellipsometry: quantitative analysis Phys. Status Solidi A 205 764-71
8. Fried M, Juhasz G, Major C, Petrik P, Polgar O, Horvath Z and Nutsch A 2011 Expanded beam (macro-imaging) ellipsometry Thin Solid Films 519 2730-6
9. Aas L M S, Ellingsen P and Kildemo M 2011 Near infra-red Mueller matrix imaging system and application to retardance imaging of strain Thin Solid Films 519 2737-41
10. Alali S, Yang T and Vitkin A I 2013 Rapid time-gated polarimetric Stokes imaging using photoelastic modulators Opt. Lett. 38 2997-3000
11. Kajihara Y, Fukuzawa K, Itoh S and Zhang H 2011 Real-time visualization of a shearing nanometer-thick lubricant film by two-stage imaging ellipsometric microscopy IEEE Trans. Magn. 47 3441-4
12. http://bruker.com/
13. http://accurion.com/
14. Forster B, Dimitri van de Ville, Berent J, Sage D and Unser M 2004 Complex wavelets for extended depth-of-field: a new method for the fusion of multichannel microscopy images Microsc. Res. Techniq. 65 33-42
15. Ohlídal M, Čudek V, Ohlídal I and Klapetek P 2005 Optical characterization of non-uniform thin films using imaging spectrophotometry Proc. SPIE 5963 596329
16. Ohlídal M, Ohlídal I, Klapetek P and Nečas D 2009 Precise measurement of thickness distribution of non-uniform thin films by imaging spectroscopic reflectometry Proc. XIX IMEKO World Congress: Fundamental and Applied Metrology, (Lisbon, Portugal, 6-11 September 2009) pp 100-5
17. zthin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry Thin Solid Films 519 2874-6
18. Nečas D, Ohlídal I, Franta D, Čudek V, Ohlídal M, Vodák J, Sládková L, Zajíčková L, Eliáš M, Vižd'a F 2013 Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry Thin Solid Films online, doi:10.1016/j.tsf.2013.12.036
19. 2Meas. Sci. Technol. 22 094021
20. 2film deposition at atmospheric pressure Plasma Process. Polym. 10 1061-73
21. Janča J, Klíma M, Slavíček P and Zajíčková L 1999 HF plasma pencil - new source for plasma surface processing Surf. Coat. Technol. 116-9 547-51
22. Benedikt J, Raballand V, Yanguas-Gil A, Focke K and Von Keudell A 2007 Thin film deposition by means of atmospheric pressure microplasma jet Plasma Phys. Contr. Fusion 49 B419-27
23. xplasma polymer films by a miniaturized atmospheric pressure plasma jet (APPJ) J. Phys. D: Appl. Phys. 41 194010
24. Raballand V, Benedikt J, Hoffmann S, Zimmermann M and von Keudell A 2009 Deposition of silicon dioxide films using an atmospheric pressure microplasma jet J. Appl. Phys. 105 083304
25. 2in a modulated microwave plasma jet at atmospheric pressure J. Phys. D: Appl. Phys. 46 225202
26. Kwon J-S, Hee Kim Y, Ha Choi E and Kim K-N 2013 Development of ultra-hydrophilic and non-cytotoxic dental vinyl polysiloxane impression materials using a nonthermal atmospheric-pressure plasma jet J. Phys. D: Appl. Phys. 46 195201
27. Ohlídal M, Ohlídal I, Klapetek P, Nečas D and Majumdar A 2011 Measurement of the thickness distribution and optical constants of non-uniform thin films Meas. Sci. Technol. 22 085104
28. Franta D, Nečas D and Zajíčková L 2007 Models of dielectric response in disordered solids Opt. Express 15 16230-44
29. Franta D, Nečas D, Zajíčková L and Ohlídal I 2014 Utilization of the sum rule for construction of advanced dispersion model of crystalline silicon containing interstitial oxygen Thin Solid Films online, doi:10.1016/j.tsf.2014.03.059
30. Nečas D and Klapetek P 2012 Gwyddion: an open-source software for SPM data analysis Cent. Eur. J. Phys. 10 181-8
31. Nečas D, Ohlídal I and Franta D 2009 The reflectance of non-uniform thin films J. Opt. A: Pure Appl. Opt. 11 045202
32. Zajíčková L, Buršíková V, Peřina V, Macková A, Subedi D, Janča J and Smirnov S 2001 Plasma modification of polycarbonates Surf. Coat. Technol. 142 449-54
33. 2in continuous wave and pulsed rf discharges Plasma Process. Polym. 4 S287-93