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Volumn 27, Issue 35, 2015, Pages 5223-5229

Low-Temperature Synthesis of Large-Scale Molybdenum Disulfide Thin Films Directly on a Plastic Substrate Using Plasma-Enhanced Chemical Vapor Deposition

Author keywords

flexible sensor; low temperature; molybdenum disulfide (MoS2< inf>); plasma enhanced chemical vapor deposition (PECVD); plastic substrate

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEPOSITION; LOW TEMPERATURE EFFECTS; MOLYBDENUM; MOLYBDENUM COMPOUNDS; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; SULFUR COMPOUNDS; TEMPERATURE; THIN FILMS;

EID: 84941318210     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201501678     Document Type: Article
Times cited : (186)

References (41)
  • 20
    • 85034310367 scopus 로고    scopus 로고
    • in, (Ed: P. F. Williams), Kluwer Academic Publishers, Dordrecht, The Netherlands/Boston, MA, USA/London, UK, p.
    • a) D. Flamm, in Plasma Processing of Semiconductors, NATO ASI Series, Series E: Applied Sciences, Vol. 336, (Ed:, P. F. Williams,), Kluwer Academic Publishers, Dordrecht, The Netherlands/Boston, MA, USA/London, UK 1997, p. 23;
    • (1997) Plasma Processing of Semiconductors, NATO ASI Series, Series E: Applied Sciences , vol.336 , pp. 23
    • Flamm, D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.