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Journal of Materials Chemistry C

Volumn 3, Issue 32, 2015, Pages 8364-8371

Atomic layer deposition of transparent semiconducting oxide CuCrO2 thin films

(3) Tripathi, T S a Niemelä, Janne Petteri a Karppinen, Maarit a

a AALTO UNIVERSITY (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMS; CHROMIUM COMPOUNDS; COPPER COMPOUNDS; OXIDE FILMS; QUALITY CONTROL; SEMICONDUCTING FILMS; SURFACE REACTIONS;

ELECTRICAL TRANSPORT MEASUREMENTS; FABRICATION OF THIN FILMS; POST-DEPOSITION ANNEAL; SEMICONDUCTING BEHAVIOR; SPECTROPHOTOMETRIC MEASUREMENTS; SURFACE REACTION MECHANISM; TRANSPARENT ELECTRONICS; TRANSPARENT SEMICONDUCTING OXIDE;

THIN FILMS;

EID: 84938695051 PISSN: 20507534 EISSN: 20507526 Source Type: Journal
DOI: 10.1039/c5tc01384d Document Type: Article

Times cited : (36)

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