Room temperature ozone sensing properties of p-type transparent oxide CuCrO2

Journal of Alloys and Compounds

Volumn 484, Issue 1-2, 2009, Pages 619-621

  Deng, Zanhong ^a,b   Fang, Xiaodong ^a,b   Li, Da ^a,b   Zhou, Shu ^a,b   Tao, Ruhua ^a,b   Dong, Weiwei ^a,b   Wang, Tao ^a   Meng, Gang ^a   Zhu, Xuebin ^b,c  

^a ANHUI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^c INSTITUTE OF SOLID STATE PHYSICS   (China)

Author keywords

Electronic properties; Optical properties; Oxide materials; Semiconductors

Indexed keywords

CUCRO; OXIDE MATERIALS; OZONE SENSOR; P-TYPE; PARENT MATERIALS; R-STRUCTURES; ROOM TEMPERATURE; SEMI-CONDUCTING PROPERTY; SEMICONDUCTORS; SENSING PROPERTY; SINTERED BULK; TRANSPARENT OXIDES; TRANSPARENT P-TYPE SEMICONDUCTOR; WIDE BAND GAP;

DEPOSITION; ELECTRONIC PROPERTIES; MATERIALS PROPERTIES; OZONE; PULSED LASER DEPOSITION; SENSORS; SINTERING; SUPERCONDUCTING WIRE; THIN FILM DEVICES; THIN FILMS;

OPTICAL PROPERTIES;

EID: 69949088966     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.05.001     Document Type: Article

References (14)

1. Kim S.R., Hong H.K., Kwon C.H., Yun D.H., Lee K., and Sung Y.K. Sens. Actuators B 66 (2000) 59
2. Sauter D., Weimar U., Noetzel G., Mitrovics J., and Göpel W. Sens. Actuators B 69 (2000) 1
3. Ando M. Trends Anal. Chem. 25 (2006) 937
4. Bender M., Gagaoudakis E., Douloufakis E., Natsakou E., Katsarakis N., Cimalla V., Kiriakidis G., Fortunato E., Nunes P., Marques A., and Martins R. Thin Solid Films 418 (2002) 45
5. Gagaoudakis E., Bender M., Douloufakis E., Katsarakis N., Natsakou E., Cimalla V., and Kiriakidis G. Sens. Actuators B 80 (2001) 155
6. Kawazoe H., Yasukawa M., Hyodo H., Kurita M., Yanagi H., and Hosono H. Nature 389 (1999) 939
7. Li D., Fang X.D., Dong W.W., Deng Z.H., Tao R.H., Zhou S., Wang J.M., Wang T., Zhao Y.P., and Zhu X.B. J. Phys. D: Appl. Phys. 42 (2009) 055009
8. Park K., Ko K.Y., Kwon H.-C., and Nahm S. J. Alloys Compd. 437 (2007) 1
9. Ong K.P., Bai K., and Wu P. J. Alloys Compd. 449 (2008) 366
10. Zheng X.G., Taniguchi K., Takahashi A., Liu Y., and Xu C.N. Appl. Phys. Lett. 85 (2004) 1728
11. Deng Z.H., Zhu X.B., Tao R.H., Dong W.W., and Fang X.D. Mater. Lett. 61 (2007) 686
12. Li D., Fang X.D., Deng Z.H., Zhou S., Tao R.H., Dong W.W., Wang T., Zhao Y.P., Meng G., and Zhu X.B. J. Phys. D: Appl. Phys. 40 (2007) 4910
13. Deng Z.H., Fang X.D., Tao R.H., Dong W.W., Li D., and Zhu X.B. J. Alloys Compd. 466 (2008) 408
14. Schwartz R.W., Schneller T., and Waser R. C. R. Chimie 7 (2004) 433