Atomic layer deposition of hexagonal and orthorhombic YMnO3 thin films

Chemistry of Materials

Volumn 21, Issue 23, 2009, Pages 5691-5694

  Uusi Esko, K ^a   Malm, J ^a   Karppinen, M ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED FILMS; CRYSTALLINE FILMS; HEXAGONAL PHASE; ORTHORHOMBIC FORMS; PEROVSKITE SUBSTRATES; POSTDEPOSITION HEAT TREATMENT; SI (100) SUBSTRATE; SRTIO; SUBSTRATE CRYSTALS; TEMPERATURE INTERVALS; TEMPERATURE RANGE;

ATOMIC LAYER DEPOSITION; CRYSTAL ORIENTATION; HEAT TREATMENT; MANGANESE; MANGANESE COMPOUNDS; OXIDE MINERALS; OZONE; PEROVSKITE; SUBSTRATES; THERMAL EFFECTS; THIN FILMS;

AMORPHOUS FILMS;

EID: 72949122569     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm9020172     Document Type: Article

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