Control of oxygen nonstoichiometry and magnetic property of MnCo 2O4 thin films grown by atomic layer deposition

Chemistry of Materials

Volumn 22, Issue 23, 2010, Pages 6297-6300

  Uusi Esko, K ^a   Rautama, E L ^a   Laitinen, M ^b   Sajavaara, T ^b   Karppinen, M ^a  

^a AALTO UNIVERSITY   (Finland)

^b UNIVERSITY OF JYVÄSKYLÄ   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

CATION RATIO; FULL CONTROL; OXYGEN CONTENT; OXYGEN NON-STOICHIOMETRY; OXYGEN PARTIAL PRESSURE; POSTDEPOSITION HEAT TREATMENT; PRECISE CONTROL; TEMPERATURE INTERVALS; UNIT-CELL VOLUME;

ATOMIC LAYER DEPOSITION; COBALT; DEPOSITION; MAGNETIC PROPERTIES; MANGANESE; OZONE; POSITIVE IONS; THIN FILMS; VAPOR DEPOSITION;

ATMOSPHERIC TEMPERATURE;

EID: 78651308150     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm102003y     Document Type: Article

References (29)

1. Nissinen, T.; Kiros, Y.; Gasik, M.; Lampinen, M. Mater. Res. Bull. 2004, 39, 1195.
2. Restovic, A.; Ríos, E.; Barbato, S.; Ortiz, J.; Gautier, J. L. J. Electroanal. Chem. 2002, 522, 141.
3. Sugawara,M.; Ohno,M.; Matsuki, K. J.Mater. Chem. 1997, 7, 833.
4. Liang, Q.; Chen, K.; Hou, W.; Yan, Q. Appl. Catal., A 1998, 166, 191.
5. Ríos, E.; Pe~na, O.; Guizouarn, T.; Gautier, J.-L. Phys. Status Solidi C 2004, 1, S108.
6. Umadevi, P.; Nagendra, C. L. Sens. Actuators, A 2002, 96, 114.
7. Alcántara, R.; Jaraba, M.; Lavela, P.; Tirado, J. L. Chem. Mater. 2002, 14, 2847.
8. Larring, Y.; Norby, T. J. Electrochem. Soc. 2000, 147, 3251.
9. Yang, Z.; Xia, G.; Simner, S. P.; Stevenson, J. W. J. Electrochem. Soc. 2005, 152, A1896.
10. Chen, X.; Hou, P. Y.; Jacobson, C. P.; Visco, S. J.; Jonghe, L. C. D. Solid State Ionics 2005, 176, 425.
11. Putkonen, M.; Sajavaara, T.; Niinistö, L.; Keinonen, J. Anal. Bioanal. Chem. 2005, 382, 1791.
12. Bazuev, G. V.; Korolov, A. V. J. Magn. Magn. Mater. 2008, 320, 2262.
13. Joy, P. A.; Date, S. K. J. Magn. Magn. Mater. 2000, 210, 31.
14. Joy, P. A.; Date, S. K. J. Magn. Magn. Mater. 2000, 218, 229.
15. Borges, F. M. M; Melo, D. M. A.; Câmara, M. S. A.; Martinelli, A. E.; Soares, J. M.; de Araújo, J. H.; Cabral, F. A. O. J. Magn. Magn. Mater. 2006, 302, 273.
16. Wickham, D. G.; Croft, W. J. J. Phys. Chem. Solids 1958, 7, 351.
17. Blasse, G. Philips Res. Rep. 1963, 18, 38.
18. Vainshtein, E. E.; Ovrutskaya, R. M.; Kotlyar, B. I. Sov. Phys. Solid State 1966, 7, 1707.
19. Nilsen, O.; Rauwel, E.; Fjellvág, H.; Kjekshus, A. J. Mater. Chem. 2007, 17, 1466.
20. Uusi-Esko, K.; Malm, J.; Karppinen, M. Chem. Mater. 2009, 21, 5691.
21. Bachmann, J.; Jing, J.; Knez, M.; Barth, S.; Shen, H.; Mathur, S.; Gösele, U.; Nielsch, K. J. Am. Chem. Soc. 2007, 129, 9554.
22. Lie, M.; Klepper, K. B.; Nilsen, O.; Fjellvág, H.; Kjekshus, A Dalton Trans. 2008, 253.
23. Hammond, G. S.; Nonhebel, D. C.; Wu, C.-H. S. Inorg. Chem. 1963, 2, 73.
24. Rodriguez-Carvajal, J.; Hennion, M.; Moussa, F.; Moudden, A. H.; Pinsard, L.; Revcolevschi, A. Phys. Rev. B 1998, 57, R3189.
25. UniQuant, Version 2, UserManual; Omega Data Systems: Veldhoven, The Netherlands, 1994.
26. Klepper, K. B.; Nilsen, O.; Fjellvág, H. Thin Solid Films 2007, 515, 7772.
27. Klepper, K. B.; Nilsen, O.; Fjellvág, H. J. Cryst. Growth 2007, 307, 457.
28. Nilsen, O.; Fjellvág, H.; Kjekshus, A. Thin Solid Films 2003, 444, 44.
29. Ylilammi, M. Thin Solid Films 1996, 279, 124.