A facile route for fabricating graphene nanoribbon array transistors using graphoepitaxy of a symmetric block copolymer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 9428, Issue , 2015, Pages

  Choi, Jonathan W ^a   Kim, Myungwoong ^a   Safron, Nathaniel S ^a   Han, Eungnak ^a   Arnold, Michael S ^a   Gopalan, Padma ^a  

^a Wisconsin Electric Machines and Power Electronics Consortium   (United States)

Author keywords

Block copolymer; graphene nanoribbons; graphene transistor; graphoepitaxy; nanopatterning

Indexed keywords

BLOCK COPOLYMERS; COPOLYMERS; ELECTRODES; FABRICATION; FIELD EFFECT TRANSISTORS; GEOMETRY; GRAPHENE; REACTIVE ION ETCHING;

EFFICIENT FABRICATION PROCESS; GRAPHENE NANO-RIBBON; GRAPHENE NANORIBBON (GNR); GRAPHENE NANORIBBONS; GRAPHENE TRANSISTORS; GRAPHOEPITAXY; NANOPATTERNING; SOURCE AND DRAIN ELECTRODES;

NANORIBBONS;

EID: 84931840981     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.2085836     Document Type: Conference Paper

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