Nanopatterning of diblock copolymer directed self-assembly lithography with wet development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7970, Issue , 2011, Pages

  Muramatsu, Makoto ^a   Iwashita, Mitsuaki ^a   Kitano, Takahiro ^a   Toshima, Takayuki ^a   Seino, Yuriko ^b   Kawamura, Daisuke ^b   Kanno, Masahiro ^b   Kobayashi, Katsutoshi ^b   Azuma, Tsukasa ^b  

^a TOKYO ELECTRON LTD   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

Directed self assembly lithography; PS b PMMA; TMAH; Wet development

Indexed keywords

DEVELOPMENT TECHNIQUE; DEVICE INTEGRATION; DIBLOCK COPOLYMER; DIRECTED SELF ASSEMBLY LITHOGRAPHY; DIRECTED SELF-ASSEMBLY; ETCHING MASKS; LOW PRESSURE MERCURY LAMPS; NANOPATTERNING; PATTERN FORMATION; PS-B-PMMA; THICKNESS LOSS; TMAH; WET DEVELOPMENT;

BLOCK COPOLYMERS; COPOLYMERIZATION; ESTERS; MERCURY (METAL); ORGANIC POLYMERS; SELF ASSEMBLY; STYRENE;

LITHOGRAPHY;

EID: 79955886068     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.878931     Document Type: Conference Paper

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