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Volumn 48, Issue 11, 2015, Pages 3422-3430

Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; COPOLYMERS; ESTERS; SELF ASSEMBLY; STYRENE; X RAY SCATTERING;

EID: 84931292189     PISSN: 00249297     EISSN: 15205835     Source Type: Journal    
DOI: 10.1021/acs.macromol.5b00518     Document Type: Article
Times cited : (125)

References (51)
  • 42
    • 0029308125 scopus 로고
    • Nose, T. Polymer 1995, 36, 2243-2248
    • (1995) Polymer , vol.36 , pp. 2243-2248
    • Nose, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.