New materials for directed self-assembly for advanced patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 9051, Issue , 2014, Pages

  Zhang, Jieqian ^a   Wu, Janet ^a   Li, Mingqi ^a   Ginzburg, Valeriy V ^b   Weinhold, Jeffrey D ^b   Clark, Michael B ^c   Trefonas III, Peter ^a   Hustad, Phillip D ^a  

^a Dow Electronic Materials   (United States)

^b DOW CHEMICAL COMPANY   (United States)

^c DOW CHEMICAL COMPANY   (United States)

Author keywords

BCP; Block copolymer; Chemoepitaxy; Directed self assembly; DSA; High ; Thermal annealing

Indexed keywords

ESTERS; PHOTOLITHOGRAPHY; REPAIR; SELF ASSEMBLY; STYRENE; TECHNOLOGY;

BCP; CHEMOEPITAXY; DIRECTED SELF-ASSEMBLY; DSA; THERMAL-ANNEALING;

BLOCK COPOLYMERS;

EID: 84902089862     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.2046328     Document Type: Conference Paper

References (26)

1. Sivaniah, E., Matsubara, S., Zhao, Y., Hashimoto, T., Fukunaga, K., Kramer, E. J., and Mates, T. E., "Symmetric Diblock Copolymer Thin Films on Rough Substrates: Microdomain Periodicity in Pure and Blended Films," Macromolecules 41(7), 2584-2592 (2008).
2. Hammond, M. R., Cochran, E., Fredrickson, G. H., and Kramer, E. J., "Temperature Dependence of Order, Disorder, and Defects in Laterally Confined Diblock Copolymer Cylinder Monolayers," Macromolecules 38(15), 6575-6585 (2005).
3. Jung, Y. S. and Ross, C. A., "Orientation-Controlled Self-Assembled Nanolithography Using a Polystyrene-Polydimethylsiloxane Block Copolymer," Nano Letters 7(7), 2046-2050 (2007).
4. Sundrani, D. and Sibener, S. J., "Spontaneous Spatial Alignment of Polymer Cylindrical Nanodomains on Silicon Nitride Gratings," Macromolecules 35(22), 8531-8539 (2002).
5. Cheng, J. Y., Sanders, D. P., Truong, H. D., Harrer, S., Friz, A., Holmes, S., Colburn, M., and Hinsberg, W. D., "Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist," ACS Nano 4(8), 4815-4823 (2010).
6. Liu, C.-C., Han, E., Onses, M. S., Thode, C. J., Ji, S., Gopalan, P., and Nealey, P. F., "Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats," Macromolecules 44(7), 1876-1885 (2011).
7. Liu, Y., Zhao, W., Zheng, X., King, A., Singh, A., Rafailovich, M. H., Sokolov, J., Dai, K. H., and Kramer, E. J., "Surface-Induced Ordering in Asymmetric Block Copolymers," Macromolecules 27(14), 4000-4010 (1994).
8. Chang, S.-W., Evans, J. P., Ge, S., Ginzburg, V. V., Kramer, J. W., Landes, B., Lee, C., Meyers, G. F., Murray, D. J., Park, J., Sharma, R., Trefonas, P., Weinhold, J. D., Zhang, J., and Hustad, P. D., "New materials and processes for directed self-assembly," Proc. SPIE 8680, 86800F-1-86800F-9 (2013).
9. Weinhold, J. D., Hustad, P. D., and Trefonas, P., "Modeling the rate of morphology evolution during annealing of block copolymer thin films," SPIE Advanced Lithography, Alternative Lithographic Technologies V, presentation 8680-7(2013)
10. Kim, B., Laachi, N., and Fredrickson, G. H., "Defectivity study of directed self-assembly of cylindrical diblock copolymers in laterally confined thin channels," Proc. SPIE 8680, 868016-1-868016-8 (2013).
11. Ginzburg, V. V., Weinhold, J. D., Hustad, P. D., and Trefonas, P., "Modeling Chemoepitaxy of Block Copolymer Thin Films using Self-Consistent Field Theory," J Photopolym Sci Tec 26(6), 817-823 (2013).
12. Takahashi, H., Laachi, N., Delaney, K. T., Hur, S. M., Weinheimer, C. J., Shykind, D., and Fredrickson, G. H., "Defectivity in Laterally Confined Lamella-Forming Diblock Copolymers: Thermodynamic and Kinetic Aspects," Macromolecules 45(15), 6253-6265 (2012).
13. Cushen, J. D., Bates, C. M., Rausch, E. L., Dean, L. M., Zhou, S. X., Willson, C. G., and Ellison, C. J., "Thin Film Self-Assembly of Poly(trimethylsilylstyrene-b-d,l-lactide) with Sub-10 nm Domains," Macromolecules 45(21), 8722-8728 (2012).
14. Cheng, J., Lawson, R. A., Yeh, W.-M., Jarnagin, N. D., Tolbert, L. M., and Henderson, C. L., "PS-b-PAA as a high polymer for directed self-assembly: a study of solvent and thermal annealing processes for PS-b-PAA," Proc. SPIE 8680, 86801V-1-86801V-4 (2013).
15. Cheng, J., Lawson, R. A., Yeh, W.-M., Jarnagin, N. D., Tolbert, L. M., and Henderson, C. L., "PS-b-PHEMA: synthesis, characterization, and processing of a high polymer for directed self-assembly lithography," Proc. SPIE 8680, 86801W-1-86801W-7 (2013).
16. Keen, I., Yu, A., Cheng, H.-H., Jack, K. S., Nicholson, T. M., Whittaker, A. K., and Blakey, I., "Control of the Orientation of Symmetric Poly(styrene)-block-poly(d,l-lactide) Block Copolymers Using Statistical Copolymers of Dissimilar Composition," Langmuir 28(45), 15876-15888 (2012).
17. Kim, S., Nealey, P. F., and Bates, F. S., "Decoupling Bulk Thermodynamics and Wetting Characteristics of Block Copolymer Thin Films," ACS Macro Letters 1(1), 11-14 (2011).
18. Kim, S., Nealey, P. F., and Bates, F. S., "Directed Assembly of Lamellae Forming Block Copolymer Thin Films near the Order-Disorder Transition," Nano Letters 14(1), 148-152 (2013).
19. Huang, E., Russell, T. P., Harrison, C., Chaikin, P. M., Register, R. A., Hawker, C. J., and Mays, J., "Using Surface Active Random Copolymers To Control the Domain Orientation in Diblock Copolymer Thin Films," Macromolecules 31(22), 7641-7650 (1998).
20. Ji, S., Liu, C.-C., Liu, G., and Nealey, P. F., "Molecular Transfer Printing Using Block Copolymers," ACS Nano 4(2), 599-609 (2009).
21. Liu, G., Ramírez-Hernández, A., Yoshida, H., Nygård, K., Satapathy, D. K., Bunk, O., de Pablo, J. J., and Nealey, P. F., "Morphology of Lamellae-Forming Block Copolymer Films between Two Orthogonal Chemically Nanopatterned Striped Surfaces," Physical Review Letters 108(6), 065502-1-065502-5 (2012).
22. Yoshida, H., Suh, H. S., Ramirez-Herunandez, A., Lee, J. I., Aida, K., Wan, L., Ishida, Y., Tada, Y., Ruiz, R., de Pablo, J., and Nealey, P. F., "Topcoat Approaches for Directed Self-Assembly of Strongly Segregating Block Copolymer Thin Films," Journal of Photopolymer Science and Technology 26(1), 55-58 (2013).
23. Bates, C. M., Seshimo, T., Maher, M. J., Durand, W. J., Cushen, J. D., Dean, L. M., Blachut, G., Ellison, C. J., and Willson, C. G., "Polarity-Switching Top Coats Enable Orientation of Sub-10-nm Block Copolymer Domains," Science 338(6108), 775-779 (2012).
24. Wang, D., Xu, C., Caporale, S. and Trefonas, P., Barclay G., "193 nm Topcoat Free Photoresist for Immersion Lithography," Proc. IEEE Lithography Workshop 16, (2006).
25. Wang, D., Caporale, S., Audes, C., Cheon, K.-S., Xu, C., Trefonas, P., Barclay, G., "Design Consideration for Immersion 193: Embedded Barrier Layer and Pattern Collapse Margin," Journal of Photopolymer Science and Technology 20(5), 687-696 (2007).
26. Wu, S., "Calculation of interfacial tension in polymer systems," Journal of Polymer Science Part C: Polymer Symposia 34(1), 19-30 (1971).