Up-scaling graphene electronics by reproducible metal-graphene contacts

ACS Applied Materials and Interfaces

Volumn 7, Issue 18, 2015, Pages 9429-9435

  Asadi, Kamal ^a   Timmering, Eugene C ^b   Geuns, Tom C T ^b   Pesquera, Amaia ^c   Centeno, Alba ^c   Zurutuza, Amaia ^c   Klootwijk, Johan H ^b   Blom, Paul W M ^a   De Leeuw, Dago M ^a,d  

^a MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

^c GRAPHENEA   (Spain)

^d KING ABDULAZIZ UNIVERSITY   (Saudi Arabia)

Author keywords

conformal transfer; contact resistance; CTLM; graphene transistor; reproducible contact

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONTACT RESISTANCE; DEPOSITION; MICROELECTRONICS; PHOTOLITHOGRAPHY;

ALTERNATIVE PROCESS; CHEMICAL VAPOR DEPOSITIONS (CVD); CONFORMAL TRANSFER; CTLM; DEPOSITION OF METALS; GRAPHENE TRANSISTORS; MICRO-ELECTRONIC DEVICES; PROCESSING PARAMETERS;

GRAPHENE;

EID: 84929180124     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/acsami.5b01869     Document Type: Article

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