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Volumn 151, Issue 23, 2011, Pages 1791-1793

Vacuum-annealed Cu contacts for graphene electronics

Author keywords

A. Graphene; B. Annealing; D. Contact resistance; E. Transfer length method

Indexed keywords

A. GRAPHENE; B. ANNEALING; CU CONTACT; D. CONTACT RESISTANCE; GRAPHENE DEVICES; POST ANNEALING; THERMAL-ANNEALING; TRANSFER LENGTH METHODS; VACUUM-ANNEALING;

EID: 80054683937     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2011.08.025     Document Type: Article
Times cited : (40)

References (12)
  • 1
    • 77952329312 scopus 로고    scopus 로고
    • Metal/graphene contact as a performance killer of ultra-high mobility graphene analysis of intrinsic mobility and contact resistance
    • K. Nagashio, T. Nishimura, K. Kita, A. Toriumi, Metal/graphene contact as a performance killer of ultra-high mobility graphene analysis of intrinsic mobility and contact resistance, 2009 IEEE International Electron Device Meeting 2009, pp. 14, doi:10.1109/IEDM.2009.5424297.
    • (2009) 2009 IEEE International Electron Device Meeting , pp. 14
    • Nagashio, K.1    Nishimura, T.2    Kita, K.3    Toriumi, A.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.