Ultraviolet/ozone treatment to reduce metal-graphene contact resistance

Applied Physics Letters

Volumn 102, Issue 18, 2013, Pages

  Li, Wei ^a,b   Liang, Yiran ^a   Yu, Dangmin ^a   Peng, Lianmao ^a   Pernstich, Kurt P ^b   Shen, Tian ^b   Hight Walker, A R ^b   Cheng, Guangjun ^b   Hacker, Christina A ^b   Richter, Curt A ^b   Li, Qiliang ^c   Gundlach, David J ^b   Liang, Xuelei ^a  

^a PEKING UNIVERSITY   (China)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c George Mason University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHANNEL REGION; CONTACT INTERFACE; CONTACT REGIONS; CONTROL EXPERIMENTS; GRAPHENE DEVICES; METAL DEPOSITION; METHYL METHACRYLATES; ULTRAVIOLET-OZONE TREATMENT;

CHEMICAL VAPOR DEPOSITION; CONTACT RESISTANCE; ELECTRIC PROPERTIES; OZONE; OZONE LAYER; PHOTORESISTS; RAMAN SPECTROSCOPY;

GRAPHENE;

EID: 84877786426     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4804643     Document Type: Article

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27. See supplementary material at http://dx.doi.org/10.1063/1.4804643 E-APPLAB-102-025320 for UVO treatment details, surface roughness, and Raman D-to-G peak intensity ratio changes during the UVO treatment process.