Design, synthesis, and photosensitive performance of polymethacrylate-positive photoresist-bearing o-nitrobenzyl group

Journal of Applied Polymer Science

Volumn 132, Issue 13, 2015, Pages

  Guo, Lingxiang ^a   Guan, Jing ^a   Zhao, Xiaofang ^a   Lin, Baoping ^a   Yang, Hong ^a  

^a SOUTHEAST UNIVERSITY   (China)

Author keywords

copolymers; optical properties; photochemsitry; properties and characterization; resins

Indexed keywords

AMMONIUM HYDROXIDE; COPOLYMERIZATION; COPOLYMERS; DIFFERENTIAL SCANNING CALORIMETRY; ELECTRIC LAMPS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GEL PERMEATION CHROMATOGRAPHY; IRRADIATION; NUCLEAR MAGNETIC RESONANCE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OPTICAL PROPERTIES; ORGANIC SOLVENTS; PHOTORESISTS; PHOTOSENSITIZERS; RESINS; TRANSFER MATRIX METHOD;

CYCLOHEXYL METHACRYLATES; GEL PERMEATION CHROMATOGRAPHY (GPC); ISOBORNYL METHACRYLATE; PHOTOACID GENERATORS; PHOTOCHEMSITRY; PROTON NUCLEAR MAGNETIC RESONANCE; REVERSIBLE ADDITION-FRAGMENTATION CHAIN TRANSFER POLYMERIZATION; TETRAMETHYL AMMONIUM HYDROXIDE;

THERMOGRAVIMETRIC ANALYSIS;

EID: 84920701600     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.41733     Document Type: Article

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