Highly ordered nanoporous thin films from photocleavable block copolymers

Macromolecules

Volumn 44, Issue 16, 2011, Pages 6433-6440

  Zhao, Hui ^a   Gu, Weiyin ^b   Sterner, Elizabeth ^b   Russell, Thomas P ^b   Coughlin, E Bryan ^b   Theato, Patrick ^a,c,d  

^a JOHANNES GUTENBERG UNIVERSITY   (Germany)

^b UNIVERSITY OF MASSACHUSETTS   (United States)

^c Seoul National University   (South Korea)

^d UNIVERSITY OF HAMBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AFTER-TREATMENT; APPLICATION EXAMPLES; CAPILLARY FORCE; CLICK CHEMISTRY; HIGHLY ORDERED ARRAYS; LONG-RANGE ORDERING; NANO-POROUS; NANODOTS; NANOPOROUS THIN FILMS; OXYGEN PLASMAS; PORE DIAMETERS; RAFT POLYMERIZATION; SOLVENT ANNEALING; UV EXPOSURE;

BLOCK COPOLYMERS; COPOLYMERIZATION; ETHYLENE; LIVING POLYMERIZATION; SILICA; STYRENE; THIN FILMS;

OXIDE FILMS;

EID: 80051742106     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma201416b     Document Type: Article

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