SCOPUS 정보 검색 플랫폼

Volumn 43, Issue 6, 2002, Pages 1963-1967

Synthesis and characterization of norbomene-based polymers with 7, 7-dimethyloxepan-2-one acid labile groups for chemically amplified photoresists

(2) Kim, Jin Baek a Lee, Jae Jun a

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

7, 7 Dimethyloxepan 2 one; ArF lithography; Chemically amplified resist

Indexed keywords

CARBOXYLIC ACIDS; EXCIMER LASERS; LITHOGRAPHY; PHOTORESISTS; SOLUTIONS; SYNTHESIS (CHEMICAL);

NORBENE-BASED COPOLYMERS;

ORGANIC POLYMERS;

7,7 DIMETHYLOXEPAN 2 ONE; KETONE; NORBORNENE DERIVATIVE; POLY(3 BICYCLO[2.2.1]HEPT 5 ENE 2 YLHYDROXYMETHYL) 7,7 DIMETHYLOXEPAN 2 ONE CO 5 [(2 DECAHYDRONAPHTHYL)OXYCARBONYL]NORBORNENE CO 5 NORBORNENE 2 CARBOXYLIC ACID CO MALEIC ANHYDRIDE; POLYMER; TETRAMETHYLAMMONIUM; UNCLASSIFIED DRUG;

AQUEOUS SOLUTION; ARTICLE; CARBON NUCLEAR MAGNETIC RESONANCE; CATALYSIS; CHEMICAL ANALYSIS; EXCIMER LASER; POLYMERIZATION; PROTON NUCLEAR MAGNETIC RESONANCE; REACTION ANALYSIS; THERMOGRAPHY;

POLYMER SCIENCE;

EID: 0037074272 PISSN: 00323861 EISSN: None Source Type: Journal
DOI: 10.1016/S0032-3861(01)00750-9 Document Type: Article

Times cited : (15)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.