Adhesion-promoted copolymers based on norbornene derivatives and maleic anhydride for 193-nm photoresists

Polymer

Volumn 41, Issue 22, 2000, Pages 8035-8039

  Kim, J B ^a   Yun, H J ^a   Kwon, Y G ^a   Lee, B W ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Adhesion; ArF excimer laser lithography; Cross linking

Indexed keywords

CROSSLINKING; DERIVATIVES; EXCIMER LASERS; GAS LASERS; PHOTOLITHOGRAPHY; PHOTORESISTS; SILICON; SYNTHESIS (CHEMICAL);

MALEIC ANHYDRIDE; NORBORNENE DERIVATIVES;

COPOLYMERS;

COPOLYMER; MALEIC ANHYDRIDE; NORBORNENE DERIVATIVE;

ARTICLE; CROSS LINKING; EXCIMER LASER; HYDROPHILICITY; POLYMERIZATION; SOLUBILITY;

EID: 0343526858     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0032-3861(00)00124-5     Document Type: Article

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