Environmentally Friendly Negative Resists Based on Acid-Catalyzed Acetalization for 193-nm Lithography

Macromolecular Rapid Communications

Volumn 24, Issue 15, 2003, Pages 879-882

  Kim, Jin Baek ^a   Jang, Ji Hyun ^a   Ko, Jong Sung ^a   Choi, Jae Hak ^a   Lee, Kwan Ku ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Crosslinking; Photoresists; Water soluble polymers

Indexed keywords

ETHANOL; MERCURY VAPOR LAMPS; SYNTHESIS (CHEMICAL);

CONTACT PRINTING MODES;

POLYMERS;

ALCOHOL; MERCURY; POLYMER; WATER; XENON;

ARTICLE; CARBON NUCLEAR MAGNETIC RESONANCE; CATALYSIS; CHEMICAL REACTION; CHEMICAL STRUCTURE; CROSS LINKING; ENVIRONMENTAL IMPACT; FOURIER TRANSFORMATION; INFRARED SPECTROSCOPY; PHOTOSENSITIVITY; POLYMERIZATION; SYNTHESIS;

EID: 0242443875     PISSN: 10221336     EISSN: None     Source Type: Journal    
DOI: 10.1002/marc.200350032     Document Type: Article

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