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Volumn 10, Issue 11, 1998, Pages 3319-3327

Alicyclic Polymers for 193 nm Resist Applications: Synthesis and Characterization

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000363715     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm9705045     Document Type: Article
Times cited : (85)

References (87)
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    • D. van Nostrand Co. Ltd.: Princeton
    • (b) Meares, P. Polymer Structure and Bulk Properties; D. van Nostrand Co. Ltd.: Princeton; p 2965. Fried, J. R. Polymer Science and Technology; Prentice Hall PTR: Englewood Cliffs, NJ, 1995.
    • Polymer Structure and Bulk Properties , pp. 2965
    • Meares, P.1
  • 3
    • 0004216752 scopus 로고
    • Prentice Hall PTR: Englewood Cliffs, NJ
    • (b) Meares, P. Polymer Structure and Bulk Properties; D. van Nostrand Co. Ltd.: Princeton; p 2965. Fried, J. R. Polymer Science and Technology; Prentice Hall PTR: Englewood Cliffs, NJ, 1995.
    • (1995) Polymer Science and Technology
    • Fried, J.R.1
  • 11
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    • MIT Lincoln Labs, personal communication
    • R. R. Kunz, MIT Lincoln Labs, personal communication, 1996.
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    • Kunz, R.R.1
  • 17
    • 85033904593 scopus 로고    scopus 로고
    • Ph.D. Thesis, The University of Texas at Austin, Austin, Texas
    • Okoroanyanwu, U. Ph.D. Thesis, The University of Texas at Austin, Austin, Texas, 1997.
    • (1997)
    • Okoroanyanwu, U.1
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    • German Pat. 1960, 1072811
    • Eleuterio, H. S. German Pat. 1960, 1072811.
    • Eleuterio, H.S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.