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Volumn 33, Issue 1, 2015, Pages

Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CATHODES; DEPOSITION; ELECTRODES; ELECTRON SOURCES; GALLIUM NITRIDE; METAL ANALYSIS; OPTOELECTRONIC DEVICES; PHOTODETECTORS; PHOTONS; PULSED LASER DEPOSITION; SEMICONDUCTOR DEVICES; THIN FILM CIRCUITS; THIN FILM TRANSISTORS; THIN FILMS; TRANSISTORS; WIDE BAND GAP SEMICONDUCTORS;

EID: 84919343937     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4903365     Document Type: Article
Times cited : (12)

References (24)
  • 2
    • 0036965549 scopus 로고    scopus 로고
    • A. Krost and A. Dadgar, Phys. State Solidi A 194, 361 (2002). 10.1002/1521-396X(200212)194:2<361::AID-PSSA361>3.0.CO;2-R
    • (2002) Phys. State Solidi A , vol.194 , pp. 361
    • Krost, A.1    Dadgar, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.