Growth of epitaxial GaN films by pulsed laser deposition

Applied Physics Letters

Volumn 71, Issue 1, 1997, Pages 102-104

  Vispute, R D ^a,e   Talyansky, V ^a   Sharma, R P ^a   Choopun, S ^a   Downes, M ^a   Venkatesan, T ^a,e   Jones, K A ^b   Iliadis, A A ^c   Asif Khan, M ^d   Yang, J W ^d  

^a University of Maryland   (United States)

^b U S ARMY RESEARCH LABORATORY   (United States)

^c UNIVERSITY OF MARYLAND   (United States)

^d APA Optronics   (United States)

^e Department of Electrical Engineering ^*

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; ENERGY GAP; LIGHT ABSORPTION; PULSED LASER APPLICATIONS; SEMICONDUCTING GALLIUM COMPOUNDS; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION;

ION CHANNELING; PULSED LASER DEPOSITION;

FILM GROWTH;

EID: 0031558215     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119441     Document Type: Article

References (20)

1. H. Morkoç, S. Strite, G. B. Gao, M. E. Lin, B. Sverdlov, and M. Burns, J. Appl. Phys. 76, 1363 (1994), and references therein.
2. Mater. Res. Soc. Bull. 22 (1997), and references therein.
3. R. J. Molnar, R. Singh, and T. D. Moustakas, Appl. Phys. Lett. 66, 268 (1995).
4. S. Nakamura, Y. Harada, and M. Seno, Appl. Phys. Lett. 58, 2021 (1991).
5. P. Rung, A. Saxler, X. Zhang, D. Walker, T. C. Wang, I. Ferguson, and M. Razeghi, Appl. Phys. Lett. 66, 2958 (1995).
6. M. A. Khan, R. A. Skogman, J. M. Van Hove, D. T. Olson, and J. N. Kuznia, Appl. Phys. Lett. 60, 1366 (1992).
7. N. H. Karam, T. Parodos, P. Colter, D. McNulty, W. Rowland, J. Schetzina, N. El-Masry, and S. M. Bedair, Appl. Phys. Lett. 67, 94 (1995).
8. I. Akasaki, H. Amano, H. Murakami, M. Sassa, H. Kato, and K. Manabe, J. Cryst. Growth 128, 379 (1993).
9. W. Qian, M. Skowronski, M. D. Graef, K. Doverspike, L. B. Rowland, and D. K. Gaskill, Appl. Phys. Lett. 66, 1252 (1995).
10. A. Ishida, E. Yamamoto, K. Ishino, K. Ito, H. Fujiyasu, and Y. Nakanishi, Appl. Phys. Lett. 67, 665 (1995).
11. W. Kim, O. Aktas, A. E. Botchkarev, A. Salvador, S. N. Mohammad, and H. Morkoç, J. Appl. Phys. 79, 7657 (1996).
12. R. C. Powell, N.-E. Lee, Y.-W. Kim, and J. E. Greene, J. Appl. Phys. 73, 189 (1993).
13. Z. Yang, L. K. Li, and W. I. Wang, Appl. Phys. Lett. 67, 1686 (1995).
14. M. J. Paisley and R. F. Devis, J. Cryst. Growth 162, 537 (1990).
15. Pulsed Laser Deposition of Thin Films, edited by D. Chrisey and G. Hubler (Wiley-Interscience, New York, 1994), and references therein.
16. R. D. Vispute, V. Talyansky, S. Choopun, M. Downes, R. P. Sharma, T. Venkatesan, M. C. Wood, R. T. Lareau, K. A. Jones, and A. A. Iliadis, Appl. Phys. Lett. 70, 2735 (1997).
17. R. D. Vispute, H. Wu, and J. Narayan, Appl. Phys. Lett. 67, 1549 (1995).
18. R.-F. Xiao, X. W. Sun, H. B. Liao, N. Cue, and H. S. Kwok, J. Appl. Phys. 80, 4226 (1996).
19. S. D. Lester, F. A. Ponce, M. G. Craford, and D. A. Steigerwald, Appl. Phys. Lett. 66, 1249 (1995).
20. P. Kung, C. J. Sun, A. Saxler, H. Ohsato, and M. Razeghi, J. Appl. Phys. 75, 4517 (1994).