Single-source AACVD of composite cobalt-silicon oxide thin films Dedicated to Don Tilley

Inorganica Chimica Acta

Volumn 422, Issue , 2014, Pages 47-56

  Hill, Michael S ^a   Johnson, Andrew L ^a   Manning, Troy D ^b   Molloy, Kieran C ^a   Wickham, Benjamin J ^a  

^a University of Bath   (United Kingdom)

^b Pilkington Group Limited   (United Kingdom)

Author keywords

AACVD; Aerosol assisted chemical vapour; Cobalt; deposition; Siloxide; Single source

Indexed keywords

AMORPHOUS SILICON; CHEMICAL ANALYSIS; COBALT; COMPOSITE FILMS; DEPOSITION; HYBRID MATERIALS; LIGANDS; MOLECULAR OXYGEN; OXIDE FILMS; SILICON COMPOUNDS; SILICON OXIDES; SINGLE CRYSTALS; SYNTHESIS (CHEMICAL); THERMOGRAVIMETRIC ANALYSIS; THIN FILMS; VAPOR DEPOSITION; X RAY POWDER DIFFRACTION;

AACVD; CHEMICAL VAPOURS; OXYGEN STOICHIOMETRY; SILICON OXIDE THIN FILMS; SILOXIDE; SINGLE CRYSTAL X-RAY DIFFRACTION ANALYSIS; SINGLE SOURCE; SINGLE-SOURCE PRECURSOR;

COBALT COMPOUNDS;

EID: 84908208754     PISSN: 00201693     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ica.2014.07.045     Document Type: Article

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