CVD elaboration and in situ characterization of barium silicate thin films

Journal of the European Ceramic Society

Volumn 30, Issue 2, 2010, Pages 441-446

  Genevès, Thomas ^a   Imhoff, Luc ^a   Domenichini, Bruno ^a   Peterlé, Paul Maurice ^a   Bourgeois, Sylvie ^a  

^a LABORATOIRE INTERDISCIPLINAIRE CARNOT DE BOURGOGNE   (France)

Author keywords

Barium; Films; Insulator; Silicate; Spectroscopy

Indexed keywords

BARIUM OXIDES; BARIUM SILICATE; CVD REACTORS; IN-SITU CHARACTERIZATION; INSULATOR; METAL ORGANIC PRECURSORS; METALORGANIC CHEMICAL VAPOR DEPOSITION; X RAY PHOTOEMISSION SPECTROSCOPY;

CHARACTERIZATION; DEPOSITION; EMISSION SPECTROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; ORGANOMETALLICS; OXYGEN; SILICATES; THIN FILMS; X RAY APPARATUS;

BARIUM;

EID: 70350704481     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2009.05.027     Document Type: Article

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