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Applied Physics Letters

Volumn 105, Issue 5, 2014, Pages

Improving metal/semiconductor conductivity using AlOx interlayers on n-type and p-type Si

(6) King, P J a Arac, E a Ganti, S a Kwa, K S K a Ponon, N a O'Neill, A G a

a NEWCASTLE UNIVERSITY (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; OHMIC CONTACTS; SILICON;

LIGHTLY DOPED; ORDERS OF MAGNITUDE; P-TYPE SI; SI SUBSTRATES; SPECIFIC CONTACT RESISTIVITY; ULTRA-THIN;

SEMICONDUCTING SILICON;

EID: 84905460066 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.4892003 Document Type: Article

Times cited : (16)

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