Transfer of pre-assembled block copolymer thin film to nanopattern unconventional substrates

ACS Applied Materials and Interfaces

Volumn 6, Issue 12, 2014, Pages 9442-9448

  Choi, Jonathan W ^a   Kim, Myungwoong ^a   Safron, Nathaniel S ^a   Arnold, Michael S ^a   Gopalan, Padma ^a  

^a Wisconsin Electric Machines and Power Electronics Consortium   (United States)

Author keywords

block copolymer; floating; graphene; lithography; unconventional substrates

Indexed keywords

BLOCK COPOLYMERS; ESTERS; GRAPHENE; INTERFACES (MATERIALS); LITHOGRAPHY; METAL CLADDING; SILICON; STYRENE; SURFACE ROUGHNESS; THIN FILMS;

ADDITIVE PROCESS; AIR/WATER INTERFACES; ALUMINUM OXIDES; BLOCK COPOLYMER THIN FILMS; FLOATING; NANO-DOT ARRAYS; NANOPOROUS TEMPLATES; TARGET-SUBSTRATE;

SUBSTRATES;

EID: 84903548898     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am501816n     Document Type: Article

References (53)

1. 11 Holes in 1 Square Centimeter Science 1997, 276, 1401-1404
2. Miyazaki, T.; Hayashi, K.; Kobayashi, K.; Kuba, Y.; Ohyi, H.; Obara, T.; Mizuta, O.; Murayama, N.; Tanaka, N.; Kawamura, Y.; Uemoto, H. Potential of a Rotary Stage Electron Beam Mastering System for Fabricating Patterned Magnetic Media J. Vac. Sci. Technol. B 2008, 26, 2611-2618
3. Zhang, Q.; Xu, T.; Butterfield, D.; Misner, M. J.; Ryu, D. Y.; Emrick, T.; Russell, T. P. Controlled Placement of CdSe Nanoparticles in Diblock Copolymer Templates by Electrophoretic Deposition Nano Lett. 2005, 5, 357-361
4. Xiao, S.; Yang, X.; Edwards, E. W.; La, Y.-H.; Nealey, P. F. Graphoepitaxy of Cylinder-Forming Block Copolymers for Use as Templates to Pattern Magnetic Metal Dot Arrays Nanotechnology 2005, 16, S324-S329
5. Black, C. T.; Ruiz, R.; Breyta, G.; Cheng, J. Y.; Colburn, M. E.; Guarini, K. W.; Kim, H. C.; Zhang, Y. Polymer Self Assembly in Semiconductor Microelectronics IBM J. Res. Dev. 2007, 51, 605-633
6. Jeong, S.-J.; Kim, J. E.; Moon, H.-S.; Kim, B. H.; Kim, S. M.; Kim, J. B.; Kim, S. O. Soft Graphoepitaxy of Block Copolymer Assembly with Disposable Photoresist Confinement Nano Lett. 2009, 9, 2300-2305
7. Segalman, R. A. Patterning with Block Copolymer Thin Films Mater. Sci. Eng. R Rep. 2005, 48, 191-226
8. Hawker, C. J.; Russell, T. P. Block Copolymer Lithography: Merging "Bottom-Up" with "Top-Down" Processes MRS Bull. 2005, 30, 952-966
9. Park, S.; Lee, D. H.; Xu, J.; Kim, B.; Hong, S. W.; Jeong, U.; Xu, T.; Russell, T. P. Macroscopic 10-Terabit-per-Square-Inch Arrays from Block Copolymers with Lateral Order Science 2009, 323, 1030-1033
10. Kim, S. H.; Misner, M. J.; Xu, T.; Kimura, M.; Russell, T. P. Highly Oriented and Ordered Arrays from Block Copolymers via Solvent Evaporation Adv. Mater. 2004, 16, 226-231
11. Kim, S. O.; Solak, H. H.; Stoykovich, M. P.; Ferrier, N. J.; de Pablo, J. J.; Nealey, P. F. Epitaxial Self-Assembly of Block Copolymers on Lithographically Defined Nanopatterned Substrates Nature 2003, 424, 411-414
12. Deng, T.; Chen, C.; Honeker, C.; Thomas, E. L. Two-Dimensional Block Copolymer Photonic Crystals Polymer 2003, 44, 6549-6553
13. Böker, A.; Elbs, H.; Hänsel, H.; Knoll, A.; Ludwigs, S.; Zettl, H.; Zvelindovsky, A. V.; Sevink, G. J. A.; Urban, V.; Abetz, V.; Müller, A. H. E.; Krausch, G. Electric Field Induced Alignment of Concentrated Block Copolymer Solutions Macromolecules 2003, 36, 8078-8087
14. Han, E.; Stuen, K. O.; La, Y.-H.; Nealey, P. F.; Gopalan, P. Effect of Composition of Substrate-Modifying Random Copolymers on the Orientation of Symmetric and Asymmetric Diblock Copolymer Domains Macromolecules 2008, 41, 9090-9097
15. Kim, M.; Han, E.; Sweat, D. P.; Gopalan, P. Interplay of Surface Chemical Composition and Film Thickness on Graphoepitaxial Assembly of Asymmetric Block Copolymers Soft Matter 2013, 9, 6135-6141
16. Hong, A. J.; Liu, C.-C.; Wang, Y.; Kim, J.; Xiu, F.; Ji, S.; Zou, J.; Nealey, P. F.; Wang, K. L. Metal Nanodot Memory by Self-Assembled Block Copolymer Lift-Off Nano Lett. 2010, 10, 224-229
17. Lin, Y.-M.; Jenkins, K. A.; Valdes-Garcia, A.; Small, J. P.; Farmer, D. B.; Avouris, P. Operation of Graphene Transistors at Gigahertz Frequencies Nano Lett. 2009, 9, 422-426
18. Kim, H. W.; Yoon, H. W.; Yoon, S. M.; Yoo, B. M.; Ahn, B. K.; Cho, Y. H.; Shin, H. J.; Yang, H.; Paik, U.; Kwon, S.; Choi, J. Y.; Park, H. B. Selective Gas Transport Through Few-Layered Graphene and Graphene Oxide Membranes Science 2013, 342, 91-95
19. Echtermeyer, T. J.; Britnell, L.; Jasnos, P. K.; Lombardo, A.; Gorbachev, R. V.; Grigorenko, A. N.; Geim, A. K.; Ferrari, A. C.; Novoselov, K. S. Strong plasmonic enhancement of photovoltage in graphene Nat. Commun. 2011, 2, 458
20. Lin, Y.-M.; Valdes-Garcia, A.; Han, S.-J.; Farmer, D. B.; Meric, I.; Sun, Y.; Wu, Y.; Dimitrakopoulos, C.; Grill, A.; Avouris, P.; Jenkins, K. A. Wafer-Scale Graphene Integrated Circuit Science 2011, 332, 1294-1297
21. Hecht, D. S.; Hu, L.; Irvin, G. Emerging Transparent Electrodes Based on Thin Films of Carbon Nanotubes, Graphene, and Metallic Nanostructures Adv. Mater. 2011, 23, 1482-1513
22. Bae, S.; Kim, H.; Lee, Y.; Xu, X.; Park, J.-S.; Zheng, Y.; Balakrishnan, J.; Lei, T.; Kim, H. R.; Song, Y. I.; Kim, Y.-J.; Kim, K. S.; Ozyilmaz, B.; Ahn, J.-H.; Hong, B. H.; Iijima, S. Roll-to-Roll Production of 30-inch Graphene Films for Transparent Electrodes Nat. Nanotechnol. 2010, 5, 574-578
23. Morozov, S. V.; Novoselov, K. S.; Katsnelson, M. I.; Schedin, F.; Elias, D. C.; Jaszczak, J. A.; Geim, A. K. Giant Intrinsic Carrier Mobilities in Graphene and Its Bilayer Phys. Rev. Lett. 2008, 100, 016602
24. Kim, D. C.; Jeon, D. Y.; Chung, H. J.; Woo, Y.; Shin, J. K.; Seo, S. The Structural and Electrical Evolution of Graphene by Oxygen Plasma-Induced Disorder Nanotechnology 2009, 20, 375703
25. Liu, H.; Liu, Y.; Zhu, D. Chemical Doping of Graphene J. Mater. Chem. 2010, 21, 3335-3345
26. Kim, M.; Safron, N. S.; Han, E.; Arnold, M. S.; Gopalan, P. Electronic Transport and Raman Scattering in Size-Controlled Nanoperforated Graphene ACS Nano 2012, 6, 9846-9854
27. Niyogi, S.; Bekyarova, E.; Itkis, M. E.; McWilliams, J. L.; Hamon, M. A.; Haddon, R. C. Solution Properties of Graphite and Graphene J. Am. Chem. Soc. 2006, 128, 7720-7721
28. Schwierz, F. Graphene Transistors Nat. Nanotechnol. 2010, 5, 487-496
29. Kim, M.; Safron, N. S.; Han, E.; Arnold, M. S.; Gopalan, P. Fabrication and Characterization of Large-Area, Semiconducting Nanoperforated Graphene Materials Nano Lett. 2010, 10, 1125-1131
30. Occhielloa, E.; Morraa, M.; Cinquinaa, P.; Garbassi, F. Hydrophobic Recovery of Oxygen-Plasma-Treated Polystyrene Polymer 1992, 33, 3007-3015
31. Williams, K. R.; Muller, R. S. Etch Rates for Micromachining Processing J. Microelectromech. S 1996, 5, 256-269
32. She, M.-S.; Lo, T.-Y.; Hsueh, H.-Y.; Ho, R.-M. Nanostructured Thin Films of Degradable Block Copolymers and Their Applications NPG Asia Mater. 2013, 5, e42
33. Safron, N. S.; Kim, M.; Gopalan, P.; Arnold, M. S. Barrier-Guided Growth of Micro- and Nano-Structured Graphene Adv. Mater. 2012, 24, 1041-1045
34. Luo, Z.; Lu, Y.; Singer, D. W.; Berck, M. E.; Somers, L. A.; Goldsmith, B. R.; Johnson, A. T. C. Effect of Substrate Roughness and Feedstock Concentration on Growth of Wafer-Scale Graphene at Atmospheric Pressure Chem. Mater. 2011, 23, 1441-1447
35. Williams, K. R.; Gupta, K.; Wasilik, M. Etch Rates for Micromachining Processing - Part II J. Microelectromech. S. 2003, 12, 761-778
36. Bellakhal, N.; Draou, K.; Brisset, J. L. Electrochemical Investigation of Copper Oxide Films Formed by Oxygen Plasma Treatment J. Appl. Electochem. 1997, 27, 414-421
37. Paeng, K.; Swallen, S. F.; Ediger, M. D. Direct Measurement of Molecular Motion in Freestanding Polystyrene Thin Films J. Am. Chem. Soc. 2011, 133, 8444-8447
38. Zhang, Q.; Gupta, S.; Emrick, T.; Russell, T. P. Surface-Functionalized CdSe Nanorods for Assembly in Diblock Copolymer Templates J. Am. Chem. Soc. 2006, 128, 3898-3899
39. Yang, S. Y.; Ryu, I.; Kim, H. Y.; Kim, J. K.; Jang, S. K.; Russell, T. P. Nanoporous Membranes with Ultrahigh Selectivity and Flux for the Filtration of Viruses Adv. Mater. 2006, 18, 709-712
40. Han, E.; In, I.; Park, S.-M.; La, Y.-H.; Wang, Y.; Nealey, P. F.; Gopalan, P. Photopatternable Imaging Layers for Controlling Block Copolymer Microdomain Orientation Adv. Mater. 2007, 19, 4448-4452
41. Liang, X.; Wi, S. Transport Characteristics of Multichannel Transistors Made from Densely Aligned Sub-10 nm Half-Pitch Graphene Nanoribbons ACS Nano 2012, 6, 9700-9710
42. Dresselhaus, M. S.; Jorio, A.; Saito, R. Characterizing Graphene, Graphite, and Carbon Nanotubes by Raman Spectroscopy Annu. Rev. Condens. Matter Phys. 2010, 1, 89-108
43. Ferrari, A. C. Raman Spectroscopy of Graphene and Graphite: Disorder, Electron-Phonon Coupling, Doping and Nonadiabatic Effects Solid State Commun. 2007, 143, 47-57
44. Safron, N. S.; Brewer, A. S.; Arnold, M. S. Semiconducting Two-Dimensional Graphene Nanoconstriction Arrays Small 2011, 7, 492-498
45. Lucchese, M. M.; Stavale, F.; Ferreira, E. H. M.; Vilani, C.; Moutinho, M. V. O.; Capaz, R. B.; Achete, C. A.; Jorio, A. Quantifying Ion-Induced Defects and Raman Relaxation Length in Graphene Carbon 2010, 48, 1592-1597
46. Cançado, L. G.; Jorio, A.; Ferreira, E. H. M.; Stavale, F.; Achete, C. A.; Capaz, R. B.; Moutinho, M. V. O.; Lombardo, A.; Kulmala, T. S.; Ferrari, A. C. Quantifying Defects in Graphene via Raman Spectroscopy at Different Excitation Energies Nano Lett. 2011, 11, 3190-3196
47. Ryu, S.; Maultzsch, J.; Han, M. Y.; Kim, P.; Brus, L. E. Raman Spectroscopy of Lithographically Patterned Graphene Nanoribbons ACS Nano 2011, 5, 4123-4130
48. Heydrich, S.; Hirmer, M.; Preis, C.; Korn, T.; Eroms, J.; Weiss, D.; Schüller, C. Scanning Raman Spectroscopy of Graphene Antidot Lattices: Evidence for Systematic p-Type Doping Appl. Phys. Lett. 2010, 97, 043113
49. Gowrishankar, V.; Miller, N.; McGehee, M. D.; Misner, M. J.; Ryu, D. Y.; Russell, T. P.; Drockenmuller, E.; Hawker, C. J. Fabrication of Densely Packed, Well-Ordered, High-Aspect-Ratio Silicon Nanopillars over Large Areas Using Block Copolymer Lithography Thin Solid Films 2006, 513, 289-294
50. 2 Nanostructures Fabricated by Block Copolymer Template for Nanoimprint Lithography ACS Nano 2009, 3, 2601-2608
51. Baruth, A.; Rodwogin, M. D.; Shankar, A.; Erickson, M. J.; Hillmyer, M. A.; Leighton, C. Non-Lift-Off Block Copolymer Lithography of 25 nm Magnetic Nanodot Arrays ACS Appl. Mater. Interfaces 2011, 3, 3472-3481
52. 3/Ar Inductively Coupled Plasma Trans. Electr. Electron. Mater. 2010, 11, 202-205
53. AZ-300T; MSDS No. DOL276039; Clariant Corporation: Somerville, NJ, Oct 16, 2000.