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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2611-2618

Potential of a rotary stage electron beam mastering system for fabricating patterned magnetic media

(11) Miyazaki, T a Hayashi, K a Kobayashi, K a Kuba, Y a Ohyi, H a Obara, T b Mizuta, O b Murayama, N b Tanaka, N b Kawamura, Y b Uemoto, H b

a Crestec Corp (Japan)

b RICOH COMPANY LTD (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON GUNS; MAGNETIC DEVICES; PARTICLE BEAMS; TIME VARYING SYSTEMS;

ACCELERATION VOLTAGES; BEAM CURRENTS; BEAM DIAMETERS; BEAM SHIFTS; BIT RATES; DISCRETE TRACK MEDIAS; DOT ARRAYS; DYNAMIC FOCUSES; ELECTRON BEAM MASTERING; FLYBACK; GROOVE PATTERNS; HIGH DENSITIES; HIGH RESOLUTIONS; HIGH THROUGHPUTS; OPTICAL-; PATTERNED MAGNETIC MEDIAS; PATTERNED MEDIAS; SERVO PATTERNS; TRACK PITCHES;

ELECTRON BEAMS;

EID: 57249094057 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.3013277 Document Type: Article

Times cited : (14)

References (10)

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