HAXPES study of CeO x thin film-silicon oxide interface

Applied Surface Science

Volumn 303, Issue , 2014, Pages 46-53

  Vorokhta, M ^a   Matolinova I ^a   Dubau, M ^a   Haviar, S ^a   Khalakhan, I ^a   Sevcikova K ^a   Mori, T ^b   Yoshikawa, H ^b   Matolin V ^a  

^a CHARLES UNIVERSITY   (Czech Republic)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Catalysis; Cerium oxide; Photoelectron spectroscopy; Silicon

Indexed keywords

CARBON FILMS; CATALYSIS; CERIUM OXIDE; FILM GROWTH; INTERFACE STATES; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; OXIDE FILMS; PHOTOELECTRON SPECTROSCOPY; PHOTOELECTRONS; PHOTONS; SILICATES; SILICON; SILICON OXIDES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

CERIUM OXIDE THIN FILMS; CONDUCTIVE SUBSTRATES; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; RF-MAGNETRON SPUTTERING; SILICON OXIDE SUBSTRATES; THIN CARBON FILMS; THIN FILM SILICON; THIN FILM SUBSTRATE;

SUBSTRATES;

EID: 84898017253     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2014.02.048     Document Type: Article

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