Preparation of magnetron sputtered thin cerium oxide films with a large surface on silicon substrates using carbonaceous interlayers

ACS Applied Materials and Interfaces

Volumn 6, Issue 2, 2014, Pages 1213-1218

  Dubau, Martin ^a   Lavková, Jaroslava ^a,b   Khalakhan, Ivan ^a   Haviar, Stanislav ^a   Potin, Valerie ^b   Matolín, Vladimír ^a   Matolínová, Iva ^a  

^a CHARLES UNIVERSITY   (Czech Republic)

^b UNIVERSITÉ DE BOURGOGNE   (France)

Author keywords

atomic force microscopy; cerium oxide thin film; electron microscopy; magnetron sputtering; oxygen plasma; porous structure

Indexed keywords

CERIUM OXIDE THIN FILMS; NITROGENATED AMORPHOUS CARBON FILMS; OXYGEN PLASMA TREATMENTS; OXYGEN PLASMAS; POROUS STRUCTURES; RF-MAGNETRON SPUTTERING; SILICON WAFER SUBSTRATES; STRUCTURE AND MORPHOLOGY;

AMORPHOUS CARBON; ATOMIC FORCE MICROSCOPY; COMPOSITE FILMS; ELECTRON MICROSCOPY; EROSION; ETCHING; MAGNETRON SPUTTERING; MAGNETRONS; OXIDE FILMS; OXIDES; OXYGEN; PLASMA APPLICATIONS; POROSITY; SILICON WAFERS; SURFACE ROUGHNESS;

FILM PREPARATION;

EID: 84892930993     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am4049546     Document Type: Article

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