Photoemission study of the tin doped cerium oxide thin films prepared by RF magnetron sputtering

Thin Solid Films

Volumn 518, Issue 8, 2010, Pages 2206-2209

  Tsud, N ^a,b   Skala T ^c   Masek K ^a   Hanys P ^a,b   Takahashi, M ^b   Suga, H ^b   Mori, T ^b   Yoshikawa, H ^b   Yoshitake, M ^b   Kobayashi, K ^b   Matolin V ^a  

^a CHARLES UNIVERSITY   (Czech Republic)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c SINCROTRONE TRIESTE   (Italy)

Author keywords

Bimetallic interaction; Magnetron sputtering; Photoelectron spectroscopy; Reduction; Synchrotron radiation; Tin cerium mixed oxide

Indexed keywords

AIR EXPOSURE; BIMETALLIC INTERACTION; CERIUM OXIDES; DEGREE OF REDUCTION; HIGH-RESOLUTION PHOTOEMISSION; IN-SITU; MIXED OXIDE; MODEL SYSTEM; RF-MAGNETRON SPUTTERING; SINGLE-CRYSTALLINE;

CERIUM; CERIUM COMPOUNDS; CHARGE TRANSFER; EMISSION SPECTROSCOPY; FILM PREPARATION; ION EXCHANGE; MAGNETRON SPUTTERING; MAGNETRONS; OXIDES; PHOTOEMISSION; PHOTOIONIZATION; PHOTONS; SYNCHROTRON RADIATION; SYNCHROTRONS; THIN FILMS; TIN; TITANIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDE FILMS;

EID: 73949123359     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.07.128     Document Type: Article

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