Silicate-free growth of high-quality ultrathin cerium oxide films on Si(111)

Physical Review B - Condensed Matter and Materials Physics

Volumn 84, Issue 23, 2011, Pages

  Flege, Jan Ingo ^a   Kaemena, Björn ^a   Gevers, Sebastian ^b   Bertram, Florian ^c   Wilkens, Torsten ^a   Bruns, Daniel ^b   Bätjer, Jan ^c   Schmidt, Thomas ^a   Wollschläger, Joachim ^b   Falta, Jens ^a  

^a UNIVERSITY OF BREMEN   (Germany)

^b UNIVERSITY OF OSNABRÜCK   (Germany)

^c DESY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84855383115     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.84.235418     Document Type: Article

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