Microresonators with Q -factors over a million from highly stressed epitaxial silicon carbide on silicon

Applied Physics Letters

Volumn 104, Issue 8, 2014, Pages

  Kermany, Atieh R ^a   Brawley, George ^b   Mishra, Neeraj ^a   Sheridan, Eoin ^b   Bowen, Warwick P ^b   Iacopi, Francesca ^a  

^a GRIFFITH UNIVERSITY   (Australia)

^b UNIVERSITY OF QUEENSLAND   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

NATURAL FREQUENCIES; Q FACTOR MEASUREMENT; RESONATORS; SILICON CARBIDE; SILICON NITRIDE; SURFACE MICROMACHINING;

EPITAXIAL SILICON CARBIDE; FUNDAMENTAL MODES; FUNDAMENTAL RESONANT FREQUENCIES; MECHANICAL QUALITY FACTORS; MICRO RESONATORS; Q-FACTORS; SILICON SURFACE MICROMACHINING; STATE OF THE ART;

AMORPHOUS SILICON;

EID: 84896788639     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4866268     Document Type: Article

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