Nanomechanical resonant structures in silicon nitride: Fabrication, operation and dissipation issues

Sensors and Actuators, A: Physical

Volumn 101, Issue 1-2, 2002, Pages 215-219

  Sekaric, L ^a   Carr, D W ^a,b   Evoy, S ^a,c   Parpia, J M ^a   Craighead, H G ^a  

^a Department of Obstetrics Gynecology   (United States)

^b NOKIA RESEARCH CENTER   (United States)

^c UNIVERSITY OF PENNSYLVANIA   (United States)

Author keywords

Dissipation; Mechanical quality factor; Nanomechanics; Silicon nitride

Indexed keywords

CHEMICAL VAPOR DEPOSITION; NANOTECHNOLOGY; SILICON NITRIDE; SILICON WAFERS;

MECHANICAL QUALITY FACTOR; NANOMECHANICAL RESONANT STRUCTURES; NANOMECHANICS;

NANOSTRUCTURED MATERIALS;

EID: 0037201865     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(02)00149-8     Document Type: Article

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