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Volumn 48, Issue 11, 2013, Pages 1901-1906

Effect of oxygen partial pressure on microstructural and optical properties of titanium oxide thin films prepared by pulsed laser deposition

(6) Balakrishnan, G a,b Bandi, Vengala Rao a Rajeswari, S M c Balamurugan, N c Babu, R Venkatesh b Song, J I a

a Changwon National University (South Korea)

b BHARATH UNIVERSITY (India)

c Peri Institute of Technology (India)

Author keywords

A. Thin films; C. X ray diffraction; D. Microstructure; D. Optical properties; Laser deposition

Indexed keywords

ATOMIC FORCE MICROSCOPY; ENERGY GAP; NANOCRYSTALLINE SILICON; NANOCRYSTALLITES; NANOCRYSTALS; OXIDE FILMS; OXIDE MINERALS; OXYGEN; PHOTOLUMINESCENCE; PULSED LASER DEPOSITION; PULSED LASERS; REFRACTIVE INDEX; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; TITANIUM DIOXIDE; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION;

GRAZING INCIDENCE X-RAY DIFFRACTION; LASER DEPOSITIONS; NANOCRYSTALLINE TITANIUM OXIDE; OXYGEN PARTIAL PRESSURE; PHOTOLUMINESCENCE PEAK; TITANIUM OXIDE THIN FILMS; UV VISIBLE SPECTROSCOPY; X-RAY DIFFRACTION STUDIES;

PARTIAL PRESSURE;

EID: 84893686776 PISSN: 00255408 EISSN: None Source Type: Journal
DOI: 10.1016/j.materresbull.2013.07.009 Document Type: Article

Times cited : (14)

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