Effect of annealing and O2 pressure on structural and optical properties of pulsed laser deposited TiO2 thin films

Journal of Alloys and Compounds

Volumn 489, Issue 1, 2010, Pages 246-251

  Shukla, Gaurav ^a   Mishra, Pratima K ^b   Khare, Alika ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY GUWAHATI   (India)

^b NATIONAL CHEMICAL LABORATORY   (India)

Author keywords

Post annealing; Pulsed laser deposition; Thin film; Titanium oxide

Indexed keywords

ANNEALING TEMPERATURES; CONTACT-ANGLE MEASUREMENTS; CRYSTALLINE QUALITY; FT-IR SPECTRUM; HYDROPHOBIC NATURE; PHOTOLUMINESCENCE SPECTRUM; POST-ANNEALING; PULSED LASER; RED SHIFT; RUTILE PHASE; SEM IMAGE; STRUCTURAL AND OPTICAL PROPERTIES; TIO; XRD;

ANGLE MEASUREMENT; ANNEALING; CONTACT ANGLE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LASERS; OPTICAL PROPERTIES; OXIDE MINERALS; PULSED LASER DEPOSITION; THIN FILM DEVICES; THIN FILMS; TITANIUM; TITANIUM OXIDES; VAPOR DEPOSITION;

DEPOSITION;

EID: 70649083151     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.09.064     Document Type: Article

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