Effects of oxygen flow ratios and annealing temperatures on Raman and photoluminescence of titanium oxide thin films deposited by reactive magnetron sputtering

Thin Solid Films

Volumn 518, Issue 5, 2009, Pages 1415-1418

  Chung, C K ^a   Liao, M W ^a   Lai, C W ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Photoluminescence; Raman; Sputtering; Thin film; Titanium oxide

Indexed keywords

ANATASE PHASE; ANNEALING TEMPERATURES; CRYSTALLINE PEAKS; DEEP LEVEL EMISSION; DIRECT-CURRENT; ELECTRON HOLE PAIRS; GAUSSIAN PEAKS; OXYGEN FLOW RATIOS; PL SPECTRA; RAMAN; RAMAN INTENSITIES; RAMAN SPECTRA; REACTIVE MAGNETRON SPUTTERING; RUTILE AND ANATASE; RUTILE PHASIS; SI (100) SUBSTRATE; TIO; TITANIUM OXIDE THIN FILMS; VISIBLE LIGHT REGION; XRD;

AMORPHOUS FILMS; LEAKAGE (FLUID); LIGHT; MAGNETRONS; OXIDE FILMS; OXIDE MINERALS; OXYGEN; OXYGEN VACANCIES; PHOTOLUMINESCENCE; PHOTOLUMINESCENCE SPECTROSCOPY; RAMAN SCATTERING; RAMAN SPECTROSCOPY; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SEMICONDUCTING SILICON COMPOUNDS; THIN FILM DEVICES; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; VACANCIES; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

TITANIUM OXIDES;

EID: 70449461507     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.09.076     Document Type: Article

References (22)

1. O'Regan, and Grätzel. Nature 353 (1991) 737
2. Masaaki K., Masaya M., Michio U., and Masakazu A. Appl. Catal. A Gen 325 (2007) 1
3. Al-Homoudi IbrahimA., Thakur J.S., Naik R., Auner G.W., and Newaz G. Appl. Surf. Sci. 253 (2007) 8607
4. San Vicente G., Morales A., and Gutie ́rrez M.T. Thin Solid Films 403-404 (2002) 335
5. Pomoni K., Vomvas A., and Trapalis CHR. J. Non-Cryst. Solids 354 (2008) 4448
6. Natarajan C., Fukunaga N., and Nogami G. Thin Solid Films 322 (1998) 6
7. Masahiro T., Narumi I., Shigeru K., and Ryozo F. Appl. Surf. Sci. 169-170 (2001) 535
8. Lianchao S., and Ping H. Thin Solid Films 455-456 (2004) 525
9. Hongfu S., Chengyu W., Shihong P., Xiping L., Ying T., Huajuan T., and Ming L. J. Non-Cryst. Solids 354 (2008) 1440
10. Boukrouh S., Bensaha R., Bourgeois S., Finot E., and Marco de Lucas M.C. Thin Solid Films 516 (2008) 6353
11. GoHmez M.M., Lu J., Olsson E., Hagfeldt A., and Granqvist C.G. Sol. Energy Mater. Sol. Cells 64 (2000) 385
12. Terufumi O., Yasuhiro K., Hiroaki U., and Hiroaki I. Mater. Chem. Phys. 111 (2008) 486
13. Tang H., Prasad K., Sanjines R., Schmid P.E., and Levy F. J. Appl. Phys. 75 (1994) 2042
14. Sekiya T., Kamei S., and Kurita S. J. Lumin. 87-89 (2000) 1140
15. Koji I., Masako G., Shogo E., Hideyuki K., Kazuhiro E., Masanori T., Noriya I., and Hiroshi S. J. Lumin. 128 (2008) 911
16. Baoshun L., Liping W., and Xiujian Z. Mater. Chem. Phys. 106 (2007) 350
17. Campuzano J.C., Kaminski A., Fretwella H., Mesota J., Sato T., Takahashi T., Norman M., Randeria M., Kadowaki K., and Hinks D. J. Phys. Chem. Solids 62 (2001) 35
18. Ke-Rong Z., Ming-Sheng Z., Qiang C., and Zhen Y. Phys. Lett. A 340 (2005) 220
19. Gr̈azel M. Heterogeneous Photochemical Electron Transfer (1989), XRC Press, Inc
20. Sze SimonM. Semiconductor devices, physics and technology. 2nd ed (2002)
21. Livraghi S., Paganini M.C., Giamello E., Selloni A., DiValentin C., and Pacchioni G. J. Am. Chem. Soc. 128 (2006) 15666
22. Henderson M.A., Epling W.S., Peden C.H.F., and Perkins C.L. J. Phys. Chem. B 107 (2003) 534