Growth and characteristics of laser deposited anatase and rutile TiO2 films on Si substrates

Thin Solid Films

Volumn 517, Issue 2, 2008, Pages 745-749

  Long, Hua ^a   Yang, Guang ^a   Chen, Aiping ^a   Li, Yuhua ^a   Lu, Peixiang ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Anatase; Pulsed laser deposition; Rutile; TiO2 films

Indexed keywords

ARGON; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; INERT GASES; INFRARED SPECTROSCOPY; KRYPTON; LASERS; MICROSCOPIC EXAMINATION; OXIDE MINERALS; OXYGEN; PLASMA DIAGNOSTICS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SPECTROSCOPIC ANALYSIS; THICK FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES;

AMBIENT GAS PRESSURES; ANATASE; ARGON AMBIENT; ARGON PRESSURES; FOURIER TRANSFORM INFRARED; NANOCRYSTAL GRAINS; OPTICAL TRANSMISSIONS; PULSED LASERS; RUTILE; RUTILE TIO; SCANNING ELECTRON MICROSCOPY IMAGES; SI (100) SUBSTRATES; SI SUBSTRATES; SMOOTH SURFACES; SPECTROMICROSCOPY; SUBSTRATE TEMPERATURES; TIO2 FILMS; TITANIUM DIOXIDE THIN FILMS; X-RAY DIFFRACTIONS;

SUBSTRATES;

EID: 55049130405     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.08.179     Document Type: Article

References (24)

1. Gyorgy E., P'erez D.P., Sauthier G., Figueras A., Alsina F., and Pascual J. J. Phys., D, Appl. Phys. 40 (2007) 5246
2. Prakasam H.E., Shankar K., Paulose M., Varghese O.K., and Grimes C.A. J. Phys. Chem. C 111 (2007) 7235
3. Zhou X.S., Lin Y.H., Li B., Li L.J., Zhou J.P., and Nan C.W. J. Phys., D, Appl. Phys. 39 (2006) 558
4. Fisher P., Maksimov O., Du H., Heydemann V., Skowronski M., and Salvador P.A. Microelectron. J. 37 (2006) 1493
5. Paily R., DasGupta A., DasGupta N., Ganguli T., and Kukreja L.M. Thin Solid Films 462-463 (2004) 57
6. Paily R., DasGupta A., DasGupta N., Bhattacharya P., Misra P., Ganguli T., Kukreja L.M., Balamurugan A.K., Rajagopalan S., and Tyagi A.K. Appl. Surf. Sci. 187 (2002) 297
7. Singh R., Paily R., DasGupta A., DasGupta N., Misra P., and Kukreja L.M. Semicond. Sci. Technol. 20 (2005) 38
8. Lu P.X., Zhou Y.H., Zheng Q.G., and Yang G. Phys. Lett. A 350 (2006) 293
9. Ohshima T., Nakashima S., Ueda T., Kawasaki H., Suda Y., and Ebihara K. Thin Solid Films 506-507 (2006) 106
10. Kitazawa S., Choi Y., and Yamamoto S. Vacuum 74 (2004) 637
11. Hartman P. Crystal Growth: An Introduction (1973), North Holland Publishing Company, Amsterdam
12. Sunagawa I. Morphology of Crystal (1987), Terra Scientific Publishing Company, Tokyo
13. Horn M., Schwerdtfeger C.F., and Meagher E.P. Z. Kristallogr. Bd. 136 (1972) 273
14. Yoo D., Kim I., Kim S., Hahn C., Lee C., and Cho S. Appl. Surf. Sci. 253 (2007) 3888
15. Luca D., Macovei D., and Teodorescu C.M. Appl. Surf. Sci. 218 (2003) 97
16. Mo S.D., and Ching W.Y. Phys. Rev. B 51 (1995) 13023
17. Simpson J.R., Drew H.D., Shinde S.R., Choudhary R.J., Ogale S.B., and Venkatesan T. Phys. Rev. B 69 (2004) 193205
18. Mardare D., Tasca M., Delibas M., and Rusu G.I. Appl. Surf. Sci. 156 (2000) 200
19. Raham M.M., Yu G.L., Krishna K.M., Soga T., Watanabe J., Jimbo T., and Umeno M. Appl. Opt. 37 (1998) 691
20. Djaoued Y., Badilescu S., Pandurang V A., Bersani D., Pierpaolo L., and Robichaud P.J. Proc. SPIE 4469 (2001) 70
21. Zhang J.Y., Boyd I.W., O'Sullivan B.J., Hurley P.K., Kelly P.V., and Senateur J.P. J. Non-Cryst. Solids 303 (2002) 134
22. Aita C.R. Appl. Phys. Lett. 90 (2007) 213112
23. Orendorz A., Brodyanski A., Losch J., Bai L.H., Chen Z.H., Le Y.K., Ziegler C., and Gnaser H. Surf. Sci. 601 (2007) 4390
24. Mazza T., Barborini E., Piseri P., Milani P., Cattaneo D., Bassi A.L., Bottani C.E., and Ducati C. Phy. Rev. B 75 (2007) 045416