Anatase-to-rutile transition of titania thin films prepared by MOCVD

Materials Research Bulletin

Volumn 32, Issue 4, 1997, Pages 431-440

  Byun, C ^a,d   Jang, J W ^b   Kim, I T ^c   Hong, K S ^b   Lee, B W ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Seoul National University   (South Korea)

^c Korea Institute of Science and Technology   (South Korea)

^d Korea Institute of Industrial Technology   (South Korea)

Author keywords

A. oxides; A. thin films; B. vapor disposition; C. X ray diffraction; D. phase transitions

Indexed keywords

ANNEALING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; THIN FILMS; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ANATASE TO RUTILE TRANSITION; LOW TEMPERATURE TRANSITION; SOURCE EFFECT;

PHASE TRANSITIONS;

EID: 0031123504     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0025-5408(96)00203-6     Document Type: Article

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