Some properties of TiO2 layers prepared by medium frequency reactive sputtering

Surface and Coatings Technology

Volumn 112, Issue 1-3, 1999, Pages 261-266

  Szczyrbowski, J ^a   Brauer G ^a   Ruske, M ^a   Bartella, J ^a   Schroeder, J ^a   Zmelty, A ^a  

^a EVONIK INDUSTRIES AG   (Germany)

Author keywords

Medium frequency reactive sputtering; Optical coating; TiO2

Indexed keywords

COMPRESSIVE STRESS; CRYSTAL MICROSTRUCTURE; DENSITY (SPECIFIC GRAVITY); FILM GROWTH; ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROHARDNESS; MORPHOLOGY; OPTICAL COATINGS; OPTICAL FILMS; SURFACE ROUGHNESS; VICKERS HARDNESS TESTING;

CHEMICAL STABILITY; MEDIUM FREQUENCY REACTIVE SPUTTERING;

TITANIUM DIOXIDE;

EID: 0033075177     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00751-8     Document Type: Article

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